Doped Carbon Pellicle for EUV Lithography
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Solution Overview
Problem
The reduction in wavelength of light used in photolithography processes for semiconductor devices necessitates a change in pellicle materials, requiring improved optical transmittance, mechanical endurance, and heat-dissipation characteristics, which existing pellicles struggle to meet.
Innovation Solution
A pellicle comprising a film with a doped region adjacent to its surface, where the dopants include boron or nitrogen, and the concentration of boron increases from the surface to a middle point and decreases towards the opposite surface, formed from carbon allotropes such as graphene or graphite, providing high optical transmittance and mechanical strength.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the wavelength of light is reduced to achieve reduced line width in semiconductor devices, then manufacturing precision is improved, but optical transmittance deteriorates due to material limitations
Solution Approach 1:
The patent changes the material parameters of the pellicle by doping carbon allotropes with boron or nitrogen, thereby altering the optical properties to achieve high transmittance in the reduced wavelength range (13.5 nm EUV light) while maintaining the ability to support reduced line width manufacturing
Solution Approach 2:
The patent creates a composite material structure by combining carbon allotropes (graphene, graphite) with dopants (boron, nitrogen) to form a new material system that exhibits both high mechanical strength and high optical transmittance in the extreme ultraviolet range, resolving the contradiction between precision requirements and light transmission
2Manufacturing precision
If the pellicle material is changed to meet reduced wavelength requirements, then manufacturing precision is improved, but mechanical strength deteriorates
Solution Approach 1:
The patent modifies the material parameters by introducing dopants into the carbon allotrope structure, which simultaneously improves optical properties for reduced wavelength operation and maintains or enhances mechanical strength through the dopant-carbon bonding structure
Solution Approach 2:
The doped carbon allotrope structure creates a composite material that combines the high strength-to-weight ratio of carbon-based materials with the optical transparency requirements, achieving both reduced line width capability and sufficient mechanical strength
3Manufacturing precision
If the pellicle material is changed to meet reduced wavelength requirements, then manufacturing precision is improved, but thermal stability deteriorates
Solution Approach 1:
The patent changes the thermal parameters of the pellicle material through doping, where the dopant atoms integrate into the carbon lattice structure to improve heat dissipation characteristics while maintaining the material's ability to support reduced wavelength photolithography
Solution Approach 2:
The doped carbon allotrope forms a composite material system that leverages the high thermal conductivity of carbon-based structures while the dopant atoms provide additional pathways for heat dissipation, achieving thermal stability compatible with reduced line width manufacturing
4Ease of manufacture
If a conventional pellicle material is used, then ease of manufacture is maintained, but reliability deteriorates due to contamination and endurance issues
Solution Approach 1:
The patent modifies the chemical parameters of the pellicle material through doping, which enhances chemical resistance and durability against contamination while maintaining compatibility with existing manufacturing processes for carbon-based materials
Solution Approach 2:
The doped carbon allotrope creates a composite material with enhanced chemical stability and resistance to contamination, improving reliability and endurance while the manufacturing process remains feasible through established carbon material fabrication techniques
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The pellicle achieves high transmittance of EUV light, maintains mechanical strength, and prevents thermal stress-induced breakage, enabling prolonged use and economic efficiency in photolithography processes.
Implementation Method 1
the pellicle achieves high transmittance of EUV light
Implementation Method 2
the doped region comprises a bond between an atom of at least one of the dopants and a carbon atom
Implementation Method 3
the pellicle achieves high transmittance of EUV light, maintains mechanical strength, and prevents thermal stress-induced breakage
Data Source
AI summary
Provided is a pellicle to be used in a photolithography process. The pellicle a film, at least a portion of which includes carbon allotropes. The film has a first surface and a second surface facing the first surface, the film comprises a doped region including dopants, the doped region adjacent to the first surface, the dopants include least one of boron or nitrogen, and the doped region comprises a bond between an atom of at least one of the dopants and a carbon atom.