Double-Container Exhaust Layout for Faster Substrate Gas Pressurization
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Solution Overview
Problem
In substrate processing, the existing double-tube configuration with fluid communication between the inner and outer reaction tubes hampers the rapid increase of partial pressure of processing gases within the process chamber, leading to reduced throughput.
Innovation Solution
A substrate processing apparatus with an inner container, an outer container, and strategically positioned inner and outer exhaust ports, along with an inert gas supply system that directs inert gas between the containers to prevent inert gas flow into the inner tube, allowing for quicker pressure increase and reduced gas consumption.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the inside of the process chamber and the exhaust space are in fluid communication via the exhaust port, then the exhaust function is improved, but the speed at which the partial pressure of processing gas increases is reduced
Solution Approach 1:
The exhaust function is segmented into two separate exhaust ports: an inner exhaust port for the process chamber and an outer exhaust port for the exhaust space. This segmentation allows independent control of exhaust flows, enabling the exhaust space to be isolated from the process chamber during pressure increase phases, thereby improving pressure increase speed while maintaining exhaust functionality through the outer exhaust port.
Solution Approach 2:
An inert gas supply system supplies inert gas to the exhaust space before processing gas is supplied to the process chamber. This preliminary action prevents processing gas from leaking into the exhaust space through the exhaust port, thereby preventing the loss of processing gas and ensuring fast pressure increase in the process chamber.
2Reliability
If the processing gas flows through the exhaust space via the exhaust port, then the exhaust function is maintained, but the processing throughput is reduced
Solution Approach 1:
The exhaust function is segmented into two separate exhaust ports: an inner exhaust port for the process chamber and an outer exhaust port for the exhaust space. This segmentation allows independent control of exhaust flows, enabling the exhaust space to be isolated from the process chamber during processing phases, thereby improving throughput while maintaining exhaust functionality through the outer exhaust port.
Solution Approach 2:
The inert gas supply system performs preliminary anti-action by filling the exhaust space with inert gas before processing gas supply. This prevents processing gas from entering the exhaust space, ensuring that all processing gas remains in the process chamber for effective substrate processing, thereby improving productivity.
3Device complexity
If the exhaust space and process chamber are in fluid communication, then the structural complexity is reduced, but the processing gas consumption increases
Solution Approach 1:
The exhaust function is segmented into two separate exhaust ports: an inner exhaust port for the process chamber and an outer exhaust port for the exhaust space. This segmentation allows independent control of exhaust flows, enabling the exhaust space to be isolated from the process chamber during processing phases, thereby reducing processing gas consumption while maintaining exhaust functionality through the outer exhaust port.
Solution Approach 2:
The inert gas supply system performs preliminary anti-action by filling the exhaust space with inert gas before processing gas supply. This prevents processing gas from leaking into the exhaust space, ensuring that processing gas is used only where needed for substrate processing, thereby reducing processing gas consumption.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables faster achievement of desired partial pressures within the process chamber, enhancing processing throughput and minimizing inert gas influence on the substrate processing.
Implementation Method 1
an inert gas supply system configured to supply an inert gas to a space between the inner container and the outer container
Implementation Method 2
an inner exhaust port provided at the side wall of the inner container such that the inner exhaust port is provided at a position facing an arrangement region of the substrate in the inner container; an outer exhaust port provided at the outer container
Data Source
AI summary
There is provided a technique that includes: an inner container accommodating a substrate; an outer container surrounding side wall of the inner container; an inner exhaust port provided at the side wall of the inner container such that the inner exhaust port is provided at position facing arrangement region of the substrate in the inner container; an outer exhaust port provided at the outer container such that the outer exhaust port is provided at position different from the position of the inner exhaust port in circumferential direction of the side wall of the inner container; a first processing gas supply system supplying a first processing gas into the inner container; and an inert gas supply system supplying an inert gas to a space between the inner and outer containers from a gas supply port provided at a position between the inner and outer exhaust ports in the circumferential direction.