Double Patterning Layout Odd Cycle Prevention

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Solution Overview

Problem

Double patterning techniques in semiconductor processing face challenges with odd cycles, where an odd number of tightly grouped structures in a closed loop pattern cannot be successfully implemented, limiting the ability to generate smaller structures closer than the wavelength of the photolithography light source.

Innovation Solution

A method and system utilizing a processor to identify and prevent odd cycles in double patterning layouts by modifying design elements, including identifying affected cycles and design modifications that may cause odd cycles, and providing notifications to ensure compliance with design rules.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If double patterning is used to generate smaller structures closer than the wavelength of the photolithography light source, then manufacturing precision is improved, but odd cycles in closed loop patterns cause implementation failures

Engineering Contradiction:

Improvestructure size and spacingVSAvoidimplementation success rate

Core Design Contradiction:

Manufacturing precisionVSReliability

Solution Approach 1:

The system performs preliminary detection of odd cycles in the layout before the double patterning process is executed. By identifying potential odd cycle problems in advance and notifying designers before manufacturing, the system prevents implementation failures while maintaining the ability to create sub-wavelength structures.

Inventive Principle:

Principle #10Preliminary action

2Adaptability or versatility

If design modifications are made to the layout, then adaptability is improved, but new odd cycles may be introduced causing implementation failures

Engineering Contradiction:

Improvedesign modification capabilityVSAvoidodd cycle freedom

Core Design Contradiction:

Adaptability or versatilityVSReliability

Solution Approach 1:

The system provides feedback to designers whenever a design modification creates or removes an odd cycle. By monitoring layout changes in real-time and notifying designers of problematic modifications, the system maintains odd cycle freedom while allowing necessary design adaptations.

Inventive Principle:

Principle #23Feedback

Solution Approach 2:

The system detects odd cycles preliminarily after design modifications are applied, before they proceed to manufacturing. This early detection allows designers to correct issues before they cause implementation failures.

Inventive Principle:

Principle #10Preliminary action

3Reliability

If automatic odd cycle detection is implemented, then reliability is improved, but processing time increases

Engineering Contradiction:

Improveodd cycle detection accuracyVSAvoidlayout processing time

Core Design Contradiction:

ReliabilityVSLoss of time

Solution Approach 1:

The system automatically detects and reports odd cycles without requiring manual intervention or complex computational resources. By using efficient algorithms that leverage the existing layout data structure, the system achieves reliable detection with minimal additional processing time.

Inventive Principle:

Principle #25Self-service

Data Source

PatentUS9298084B2Preventing double patterning odd cycles

Publication Date: 2016.03.29 SYNOPSYS INC

AI summary

A method, system or computer usable program product for preventing odd cycles caused by design modifications to a double patterning layout including utilizing a processor to identify a set of double patterning cycles in the layout for storage in a memory; receiving a set of design modifications to the layout; utilizing the processor to identify from the set of double patterning cycles a subset of double patterning cycles affected by the set of design modifications; utilizing the processor to identify from the set of design modifications a subset of design modifications which may cause odd cycles in the subset of double patterning cycles; and providing a notification of the subset of design modifications.