Double Pipe Nozzle for Photoresist Dispensing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing semiconductor device manufacturing processes face challenges in efficiently performing multi-suck-back operations and reducing resist consumption without moving the nozzle arm, and in effectively rinsing the nozzle tip without mechanical movement.
Innovation Solution
A nozzle with a double pipe structure is used, where an inner pipe with a conical shape is used for photoresist transfer and an outer pipe with a conical shape is used for thinner transfer, allowing for multi-suck-back and reduced resist consumption operations without moving the nozzle arm, and enabling automatic tip rinsing through thinner ejection from the outer pipe.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single pipe nozzle is used, then the structure is simple, but multi-suck-back and tip rinsing operations require moving the nozzle arm, increasing complexity and contamination risk
Solution Approach 1:
The nozzle is divided into two separate pipes: an inner pipe for photoresist delivery and an outer pipe for thinner delivery. This segmentation allows independent control of photoresist and thinner flows, enabling multi-suck-back and tip rinsing operations without moving the nozzle arm, thus resolving the contradiction between structural simplicity and operational ease.
Solution Approach 2:
The inner pipe is nested within the outer pipe, creating a compact double-pipe structure. The inner pipe delivers photoresist while the outer pipe delivers thinner for rinsing operations. This nested configuration maintains structural simplicity while enabling complex operations (multi-suck-back and tip rinsing) without requiring nozzle arm movement.
2Reliability
If the nozzle arm is moved for tip rinsing, then rinsing can be performed, but the process time increases and contamination risk increases
Solution Approach 1:
By segmenting the fluid delivery system into separate inner and outer pipes for photoresist and thinner respectively, the system enables tip rinsing to be performed independently without moving the nozzle arm, reducing process time and contamination risk while maintaining rinsing effectiveness.
Solution Approach 2:
The nozzle performs its own tip rinsing by ejecting thinner from the outer pipe directly at the tip location, without requiring external intervention or nozzle arm movement. This self-service capability reduces process time and minimizes contamination opportunities.
3Loss of substance
If the nozzle arm is moved for multi-suck-back operation, then photoresist can be recovered, but process complexity and contamination risk increase
Solution Approach 1:
The segmented double-pipe structure enables independent control of photoresist and thinner flows, allowing multi-suck-back operations to be performed by controlling the inner and outer pipes separately without requiring nozzle arm movement, thus reducing operation complexity while improving photoresist recovery.
Solution Approach 2:
The nested double-pipe configuration allows the inner pipe to perform photoresist suction while the outer pipe provides thinner for flushing, enabling efficient multi-suck-back operations without moving the nozzle arm, reducing both complexity and contamination risk.
4Manufacturing precision
If separate nozzles are used for photoresist and thinner, then each can be optimized, but the overall system complexity and alignment difficulty increase
Solution Approach 1:
By nesting the inner photoresist pipe within the outer thinner pipe, the system achieves precise alignment of both nozzle tips at the same location without requiring separate nozzle assemblies. This nested configuration simplifies the overall structure while maintaining manufacturing precision for tip alignment.
Solution Approach 2:
The system merges two separate nozzle functions (photoresist delivery and thinner delivery) into a single integrated double-pipe nozzle assembly. This combination maintains the ability to optimize each fluid delivery path while eliminating the alignment and positioning complexities associated with separate nozzles.
Data Source
AI summary
Provided are a nozzle having a double pipe structure in which multi-suck-back is possible without driving a nozzle arm, and also, a reduced resist consumption (RRC) operation and a nozzle tip rinsing operation are possible without moving the nozzle arm, and a photoresist (PR) dispenser and a spin coater, each including the nozzle. The nozzle includes an inner pipe having a conical shape gradually narrowing downward, through which PR is transferred, and having a tip through which the PR is ejected, and an outer pipe surrounding the inner pipe, having a conical shape gradually narrowing downward, through which thinner is transferred, and having a tip through which the thinner is ejected, wherein the nozzle is coupled to a nozzle arm and moved, and multi-suck-back is performed without driving the nozzle arm.