Double-Sided Die Interconnect Layout for Shorter Chip Stacking Paths
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Solution Overview
Problem
Existing semiconductor die stacking methods involving additional interconnection elements like interposers or TSVs increase cost and complexity, and lengthen die-to-die interconnects.
Innovation Solution
A semiconductor package design where a first die has interconnect layers on both sides, allowing direct coupling to a second die without intervening structures like TSVs, reducing thickness and interconnect length.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If additional interconnection elements like interposers or TSV structures are used for die to die stacking, then die to die interconnection can be achieved, but cost and complexity increase
Solution Approach 1:
The patent extracts and eliminates the additional interconnection elements (interposers, TSV structures) from the stacking architecture. By forming interconnect layers directly on both sides of the semiconductor die, the invention removes the need for separate interposition structures, thereby reducing complexity while maintaining interconnection functionality
Solution Approach 2:
The patent merges the interconnection function into the die structure itself by forming interconnect layers on both the first and second major surfaces of the semiconductor die. This integration combines the die substrate and interconnection elements into a unified structure, eliminating the need for separate interposer components
2Reliability
If additional interconnection elements like interposers or TSV structures are used for die to die stacking, then die to die interconnection can be achieved, but manufacturing cost increases
Solution Approach 1:
The patent extracts and eliminates the additional interconnection elements (interposers, TSV structures) from the stacking architecture. By forming interconnect layers directly on both sides of the semiconductor die, the invention removes the need for separate interposition structures, thereby reducing complexity while maintaining interconnection functionality
Solution Approach 2:
The patent replaces expensive, complex interposer structures with simpler, more cost-effective interconnect layers formed directly on the die surfaces. This substitution uses more economical manufacturing processes while achieving the same interconnection purpose
3Reliability
If additional interconnection elements like interposers or TSV structures are used for die to die stacking, then die to die interconnection can be achieved, but die to die interconnect length increases
Solution Approach 1:
The patent extracts and eliminates the additional interconnection elements (interposers, TSV structures) from the stacking architecture. By forming interconnect layers directly on both sides of the semiconductor die, the invention removes the need for separate interposition structures, thereby reducing complexity while maintaining interconnection functionality
Solution Approach 2:
The patent utilizes both major surfaces of the semiconductor die for interconnection purposes, effectively using the third dimension (depth/thickness) to reduce interconnect length. By forming interconnect layers on opposite surfaces, the patent creates direct, short pathways for electrical connections between stacked dies
Data Source
AI summary
An apparatus is provided which comprises: a first die having a first surface and a second surface, the first die comprising: a first layer formed on the first surface of the first die, and a second layer formed on the second surface of the first die; a second die coupled to the first layer; and a plurality of structures to couple the apparatus to an external component, wherein the plurality of structures is coupled to the second layer.


