Double-Sided IC Die Layout for High-Density TSV Interconnects

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Solution Overview

Problem

Existing semiconductor technologies face challenges in increasing integration density and improving signal transmission efficiency between components, particularly in 3D integrated circuits, while also requiring efficient heat dissipation and supporting diverse semiconductor materials like GaAs, GaN, and SiC.

Innovation Solution

The integration of a double-sided integrated circuit die with symmetrical layouts on both sides of a substrate, utilizing TSVs for vertical interconnects, and a package structure that allows for high-bandwidth memory implementation, enabling efficient signal transmission and heat dissipation across both sides of the die.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If a 3D package with edge wiring is used to increase interconnect density, then connectivity between chips is improved, but the package length and width increase

Engineering Contradiction:
Improveinterconnect densityVSAvoidpackage area
Core Design Contradiction:
Quantity of substanceVSArea of stationary object

Solution Approach 1:

The patent transitions from 2D edge wiring to 3D vertical interconnection through TSVs. By forming vertical connections through the chip body, the interconnect density increases in the vertical dimension while maintaining a compact footprint, thus resolving the contradiction between interconnect density and package area.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

Instead of wiring chips along their edges (horizontal connection), the patent inverts the approach by forming vertical connections through the chip body using TSVs. This inversion of the connection direction enables higher interconnect density without increasing package area.

Inventive Principle:
Principle #13The other way round (Inversion)

2Reliability

If an interposer layer is added between stacked chips to improve connectivity, then signal transmission is enhanced, but device complexity increases

Engineering Contradiction:
Improvesignal transmission qualityVSAvoidpackage structure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent extracts and eliminates the interposer layer from the 3D package structure. By directly bonding chips together with TSV-based vertical interconnections, the complex interposer layer is removed while maintaining signal transmission quality, thus reducing device complexity.

Inventive Principle:
Principle #2Taking out (Extraction)

3Productivity

If integration density is increased through 3D stacking to improve productivity, then component density is enhanced, but heat dissipation becomes more difficult

Engineering Contradiction:
Improveintegration densityVSAvoidheat dissipation efficiency
Core Design Contradiction:
ProductivityVSTemperature

Solution Approach 1:

The patent utilizes the vertical dimension for heat dissipation by implementing heat sinks and thermal management structures on the top and bottom surfaces of the stacked chips. This three-dimensional thermal management approach enables effective heat dissipation while maintaining high integration density through vertical stacking.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Data Source

PatentUS20250338626A1High bandwidth double-sided integrated circuit die and integrated circuit package including the same
Publication Date: 2025.10.30 HWANG MYEONG EUN
  • US20250338626A1 patent drawing
  • US20250338626A1 patent drawing
  • US20250338626A1 patent drawing

AI summary

According to one aspect of the disclosure, there is provided an integrated circuit die includes: a substrate; a head structure including a first device layer in a head side of the substrate, a first wiring layer on the first device layer, and a first passivation layer on the first wiring layer, and a tail structure including a second device layer in a tail side of the substrate opposite to the head side, a second wiring layer on the second device layer, and a second passivation layer on the second wiring layer, wherein the tail structure is horizontally symmetrical to the head structure at least partially in view of an integrated circuit layout perspective.