Double-Sided Scrubber With Multi-Nozzle Cleaning for Semiconductor Substrates
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Solution Overview
Problem
Conventional wet processing systems for semiconductor substrates require multiple tanks in series, occupying significant factory floor space and introducing inefficiencies due to the need for sequential dipping in different chemicals, which is time-consuming and inefficient.
Innovation Solution
A double-sided scrubber with rotating brushes and multiple sets of nozzles that spray different chemicals and DI water simultaneously at the substrate interface, allowing for efficient and continuous cleaning without the need for sequential dipping.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple tanks are arranged in series for wet processing, then substrate cleaning thoroughness is improved, but factory floor space occupation increases
Solution Approach 1:
The patent merges multiple separate tank-based cleaning operations into a single integrated scrubber unit. The scrubber combines multiple brushes (first brush, second brush), multiple nozzle sets (first set, second set), and multiple chemical delivery systems into one compact device that performs sequential cleaning functions that previously required separate tanks arranged in series.
Solution Approach 2:
The invention transitions from a horizontal arrangement of multiple tanks occupying floor space to a vertical/three-dimensional integration within a single scrubber unit. The scrubber uses vertical stacking of brushes and nozzles, with substrates processed vertically between the first and second brushes, thereby reducing the horizontal footprint while maintaining multi-step cleaning capability.
2Manufacturing precision
If multiple tanks are arranged in series for wet processing, then sequential chemical treatment is improved, but operational efficiency deteriorates
Solution Approach 1:
The scrubber enables continuous processing by eliminating the need to transfer substrates between separate tanks. The substrate remains in the scrubber chamber throughout the entire cleaning sequence, allowing continuous chemical application and rinsing without interruption. The system can process substrates continuously as they are fed through the scrubber, rather than requiring discrete loading and unloading operations at multiple tank stations.
Solution Approach 2:
The patent combines multiple chemical delivery systems and rinse mechanisms into a single integrated unit. The first and second nozzles of each set can deliver different chemicals sequentially, and the brushes provide continuous mechanical agitation, all within one chamber, eliminating the operational inefficiencies of moving substrates between separate treatment stations.
3Area of stationary object
If a single scrubber unit is used instead of multiple tanks, then space requirements are reduced, but device complexity increases
Solution Approach 1:
The scrubber is divided into distinct functional modules: first brushes (first brush, second brush), first nozzles, second nozzles, and associated chemical delivery systems. Each module performs a specific function and can be independently controlled or maintained. This segmentation allows the complex functionality to be organized into manageable, modular components that can be assembled and serviced separately.
Solution Approach 2:
The scrubber unit is designed as a multi-functional device that performs multiple cleaning operations (different chemical treatments, rinsing, mechanical scrubbing) within a single chamber. The first and second nozzles can deliver different chemicals, the brushes provide mechanical agitation, and the integrated design allows one unit to replace multiple specialized tanks, thereby reducing overall system complexity despite the increased functionality of the single unit.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The double-sided scrubber system reduces space requirements and enhances cleaning efficiency by enabling simultaneous application of multiple chemicals and DI water, minimizing redeposition of debris and by-products, and optimizing the cleaning process.
Implementation Method 1
a double-sided scrubber including a pair of brushes. Each brush of the pair of brushes may be (a) substantially cylindrical and may be configured to rotate about a longitudinal axis of the brush
Implementation Method 2
The pair of brushes may be arranged such that the substrate is configured to move back-and-forth between the pair of brushes
Implementation Method 3
A first set of nozzles may be fluidly coupled together and configured to spray a first liquid at an interface between the substrate and the pair of brushes
Implementation Method 4
A second set of nozzles may be fluidly coupled together and configured to spray a second liquid at the interface
Implementation Method 5
directing de-ionized water to the moving substrate through the pair of rotating brushes
Data Source
AI summary
A substrate cleaning device includes a double-sided scrubber that directs a liquid to a substrate as it moves back-and-forth between a pair of rotating brushes. The device may also include a first set of nozzles and a second set of nozzles. The first set of nozzles may be configured to spray a first liquid at an interface between the substrate and rotating brushes and the second set of nozzles may be configured to spray a second liquid at the interface as the substrate moves back-and-forth between the pair of rotating brushes.