Downward-Burning Reactor Chamber for Toxic Gas Purification
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Solution Overview
Problem
Existing gas purification systems for toxic gases from semiconductor production face issues with high temperature loads on reactor components, leading to rapid wear and frequent cleaning needs due to upwardly burning flames and subsequent deposition of solid reaction products.
Innovation Solution
A reactor chamber design featuring an internal wall that tapers at the base like a funnel, with a water film flowing downwards and a surrounding water cloak, combined with a downwardly burning burner or electrically heated chamber, and a connected water circuit for cooling and sorbent treatment, effectively reducing thermal stress and preventing deposits.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If an upwardly burning flame is used in the reactor chamber, then thermal conversion of toxic gases is achieved, but solid reaction products deposit on the burner and internal wall, causing rapid wear and frequent cleaning needs
Solution Approach 1:
The patent inverts the conventional upward-burning flame configuration by implementing a downward-burning flame. The burner is positioned at the top of the reactor chamber with the flame directed downward, causing solid reaction products to fall away from the burner instead of depositing on it. This inversion resolves the deposition problem and extends burner service life.
Solution Approach 2:
The patent extracts the harmful deposition effect by changing the flame direction. By positioning the burner at the top and burning downward, the solid reaction products are separated from the burner surface, preventing adhesion and eliminating the need for frequent cleaning procedures.
2Productivity
If high temperatures are used for thermal conversion, then toxic gases are effectively purified, but structural elements are exposed to high thermal stress, leading to rapid wear
Solution Approach 1:
The patent introduces a water film as an intermediary protective layer on the internal wall surface. This water film acts as a thermal barrier, protecting the structural elements from direct exposure to high temperatures while allowing the thermal conversion process to proceed effectively. The water film absorbs thermal stress and prevents direct heat transfer to the reactor chamber walls.
3Temperature
If a water spray is used to cool the reactor chamber, then thermal stress is reduced, but water may be sprayed into the flame, interfering with combustion
Solution Approach 1:
The patent inverts the spatial arrangement by positioning the burner at the top and burning downward, while the water spray is applied from above. This configuration ensures that the water film forms on the internal wall surface without interfering with the downward-burning flame, as the flame direction is opposite to the conventional upward spray configuration.
Solution Approach 2:
The patent applies water spray locally to the internal wall surface rather than into the combustion zone. The water film is formed on the cooled external wall surface, creating a localized cooling effect that protects the reactor chamber structure without interfering with the flame and combustion process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design achieves high gas throughput with efficient cooling of the reactor chamber, reducing wear on components and the need for frequent cleaning, while ensuring effective purification of toxic gases.
Implementation Method 1
a film of water flowing downwards in a uniform manner on the inner face of the internal wall
Implementation Method 2
The exterior of the internal wall of the reactor chamber is surrounded by a cloak of water
Implementation Method 3
the unit for the thermal treatment of the toxic gases is a burner with a downwardly burning flame
Implementation Method 4
the thermally treated reaction products are completely harmless and are present either in gaseous or solid form
Implementation Method 5
a connection for a water circuit are located at the lower end of the tapering internal wall
Data Source
AI summary
An assembly is provided for purifying toxic gases from production processes by thermal conversion in a reactor chamber and subsequent treatment of reaction products with a sorption agent in a washing device in order to bind water-soluble reaction products and to elute solid reaction products. The reactor chamber has an external wall and an internal wall, the internal wall tapering at its base in the form of a funnel at a predetermined angle. A unit for thermal treatment of toxic gases is located on the reactor chamber, sealing the top of the chamber. An inner face of the internal wall of the reactor chamber comprises a film of water flowing downwards in a uniform manner. The exterior of the internal wall is surrounded by a cloak of water. A waste gas outlet and a connection for a water circuit are located at the lower end of the tapering internal wall.