DRAM Capacitor Structure With Common Top Cell Plate

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Solution Overview

Problem

The challenge in dynamic random access memory (DRAM) devices is to maintain sufficient storage node capacitance while increasing circuit density, as scaling down integrated circuits requires larger capacitor cell plates to counter parasitic capacitance and noise, which is difficult to achieve with traditional two-transistor memory cells.

Innovation Solution

A capacitor structure with a pair of electrically separated electrodes sharing a common top cell plate is developed, formed through specific fabrication steps involving patterned photoresist, hemispherical grain silicon formation, and planarization to create individual storage node electrodes and a common top cell plate, enhancing capacitance without increasing die size.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If traditional two-transistor memory cell structures are used, then circuit density can be increased, but storage node capacitance becomes insufficient due to parasitic capacitance and noise

Engineering Contradiction:
Improvecircuit densityVSAvoidstorage node capacitance
Core Design Contradiction:
Quantity of substanceVSReliability

Solution Approach 1:

The capacitor structure is divided into multiple electrodes (first electrode, second electrode, third electrode, fourth electrode) arranged in a stacked configuration. This segmentation allows each electrode to contribute to the overall capacitance, enabling sufficient storage node capacitance to be achieved within a compact footprint that supports high circuit density.

Inventive Principle:
Principle #1Segmentation

2Reliability

If capacitor cell plates are made larger to maintain sufficient capacitance, then storage node capacitance is improved, but circuit density decreases

Engineering Contradiction:
Improvestorage node capacitanceVSAvoidcircuit density
Core Design Contradiction:
ReliabilityVSQuantity of substance

Solution Approach 1:

The capacitor structure transitions from a planar configuration to a three-dimensional stacked configuration with multiple electrodes arranged vertically. This dimensional change allows the capacitor to achieve sufficient capacitance without increasing the lateral footprint, thereby maintaining high circuit density while meeting capacitance requirements.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Quantity of substance

If more memory cells are packed into the same die size, then circuit density increases, but charge storage capability per cell is reduced

Engineering Contradiction:
Improvememory cell densityVSAvoidcharge storage capability
Core Design Contradiction:
Quantity of substanceVSReliability

Solution Approach 1:

The capacitor electrodes are nested in a stacked configuration where multiple electrodes are arranged in layers (first electrode with second electrode, third electrode with fourth electrode). This nesting allows maximum utilization of vertical space, enabling sufficient capacitance to be achieved within a compact cell area that supports high memory cell density.

Inventive Principle:
Principle #7Nested doll (Nesting)

Data Source

PatentUS7488664B2Capacitor structure for two-transistor DRAM memory cell and method of forming same
Publication Date: 2009.02.10 MICRON TECHNOLOGY INC
  • US7488664B2 patent drawing
  • US7488664B2 patent drawing
  • US7488664B2 patent drawing

AI summary

A capacitor structure for a semiconductor assembly and a method for forming same are described. The capacitor structure comprises a pair of electrically separated capacitor electrodes and a capacitor electrode being common to only the pair of electrically separated capacitor electrodes.