Semiconductor Drain Pipe Cleaning Device Preventing Photoresist Clogging
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Solution Overview
Problem
Clogging in pipes of processing equipment due to progressive crystallization and deposition of photoresist in semiconductor manufacturing processes, which leads to inefficiencies and maintenance challenges.
Innovation Solution
A cleaning device comprising a top, middle, and bottom portion with an annular channel and passageways, connected by welding or adhesive bonding, that uses a solvent tank, valve, and controller to pre-wet and intermittently clean the drain pipe, preventing crystallization and deposition through solvent flow and vaporization.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the drain pipe is long to connect the exhaust pipe to the drain tank, then the discharge function is improved, but crystallization and deposition occur causing clogging
Solution Approach 1:
The cleaning device performs preliminary action by introducing solvent through the annular channel and passageways to pre-wet and clean the drain pipe before crystallization can occur, preventing clogging in advance while maintaining the long pipe configuration for proper discharge function
Solution Approach 2:
The cleaning device acts as an intermediary component between the exhaust pipe and drain tank, using solvent as a mediating substance to prevent crystallization and deposition in the drain pipe and curved pipe, thereby resolving the clogging issue without shortening the pipe length
2Ease of operation
If the curved pipe is used to discharge liquid to the facility piping system, then the discharge path is established, but crystallization and deposition lead to clogging in the curved portion
Solution Approach 1:
The cleaning device introduces solvent through the annular channel and passageways to pre-wet the curved pipe before crystallization occurs, preventing deposition in the curved portion while maintaining the established discharge path to the facility piping system
3Productivity
If photo resister is discharged through the exhaust pipe and drain pipe, then the processing liquid is removed, but progressive crystallization and deposition clog the pipes
Solution Approach 1:
The cleaning device enables continuous useful action by intermittently introducing solvent through the valve and controller to continuously prevent crystallization and deposition in the drain pipe, ensuring uninterrupted processing liquid removal without pipe clogging
Solution Approach 2:
The solvent introduced through the cleaning device acts as an intermediary substance that prevents photo resister crystallization and deposition in the drain pipe, maintaining pipe畅通性 while preserving the processing liquid removal function
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively prevents clogging by pre-wetting and cleaning the drain pipe and curved pipe, ensuring smooth flow of processing liquids and reducing maintenance needs in semiconductor manufacturing processes.
Implementation Method 1
preventing crystallization and deposition through solvent flow and vaporization
Implementation Method 2
pre-wet and intermittently clean the drain pipe
Implementation Method 3
cleaning the drain pipe and curved pipe, ensuring smooth flow of processing liquids
Data Source
AI summary
A cleaning device is provided, including a top portion, a middle portion, and a bottom portion. The top portion includes a first opening. The middle portion is connected to the top portion, and includes an inlet on a lateral side, an annular channel communicated with the inlet, and a second opening communicated with the first opening. The bottom portion is connected to the middle portion, and includes a reservoir and a third opening. The third opening communicates the second opening and the reservoir.