Drawer Unit for Face Down Plating Anode Maintenance
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Solution Overview
Problem
Face down-type plating apparatuses face challenges in maintenance due to the low workability and time-consuming operations required for components placed in the lower portion, such as the anode and variable anode mask, which are difficult to access and replace.
Innovation Solution
A plating apparatus with a drawer unit that allows the anode and variable anode mask to be freely drawn out horizontally, integrated with a drive shaft and bus bar for easy maintenance, and an actuator to adjust the opening size of the variable anode mask, facilitating the adjustment and replacement of these components without detaching parts above the anode.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the anode and variable anode mask are placed in the lower-most portion of the plating tank, then the electric field regulation efficiency is improved, but the maintenance workability and operating rate deteriorate
Solution Approach 1:
The plating tank is divided into multiple maintenanceable sections. The anode and variable anode mask are grouped together in a removable assembly that can be accessed by opening the plating tank from the side, allowing maintenance without removing all upper components. This segmentation enables independent access to the lower portion components while maintaining their functional positioning for effective electric field regulation.
2Measurement precision
If the anode and variable anode mask are placed in the lower-most portion of the plating tank, then the electric field regulation efficiency is improved, but the maintenance time increases
Solution Approach 1:
The anode and variable anode mask are pre-assembled as an integrated unit before being installed in the plating tank. This preliminary assembly allows both components to be replaced simultaneously as a single unit, eliminating the need for sequential replacement and reducing maintenance time while maintaining their optimized lower-most positioning for electric field regulation.
3Measurement precision
If the anode and variable anode mask are placed in the lower-most portion of the plating tank, then the electric field regulation efficiency is improved, but the operating rate deteriorates
Solution Approach 1:
The plating tank is designed with dynamic accessibility, allowing rapid opening and closing of side access points. The anode and variable anode mask assembly can be quickly removed and reinstalled through these dynamic access points, minimizing disruption to the overall operating rate while maintaining the components in their optimal lower-most positions for continuous electric field regulation during plating operations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration simplifies maintenance and replacement of the anode and variable anode mask, improving the operational efficiency and reducing downtime, thus enhancing the overall workability and operating rate of the plating apparatus.
Implementation Method 1
a face down-type or cup-type plating apparatus as described in Japanese Unexamined Patent Publication No. 2006-241599 (PTL 1) and Description of U.S. Pat. No. 7,351,314 (PTL 2) has been known as a plating apparatus configured to plate a substrate
Implementation Method 2
an anode placed therein; and a substrate holder (also called a plating head) placed above the anode and configured to hold a substrate as a cathode
Implementation Method 3
a variable anode mask that includes an opening which the anode is exposed from and that is configured to adjust an opening size of the opening... in order to regulate the electric field from the anode toward the substrate with high efficiency
Data Source
AI summary
One object of the present disclosure is to facilitate maintenance of components placed in a lower portion of a face down-type apparatus for plating. There is provided an apparatus for plating, comprising: a plating tank configured to store a plating solution therein; a substrate holder configured to hold a substrate in such a state that a plating surface of the substrate faces down; and a drawer unit mounted to the plating tank to be freely drawable in a horizontal direction and provided with an anode that is placed to be opposed to the substrate in the plating tank and with a variable anode mask that includes an opening which the anode is exposed from and that is configured to adjust an opening size of the opening.