Polishing Pad Dresser Structure for Convex Thickness Control
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Solution Overview
Problem
Existing polishing apparatuses face challenges in forming convex portions on polishing pads effectively, leading to issues with pad cut rate, roughness, and particle accumulation due to inflexible control over the thickness and density of these convex portions.
Innovation Solution
A dresser is designed with a substrate and a stopper layer, where convex portions are formed via epitaxial growth and covered by a thin film, allowing independent adjustment of the thickness of the convex portions relative to the pitch, thereby optimizing pad cut rate and roughness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If convex portions are formed on the polishing pad, then polishing performance is improved, but pad cut rate increases and particles accumulate
Solution Approach 1:
The patent applies parameter changes by independently controlling the thickness of the convex portions and the pitch between them. By adjusting these parameters, the polishing performance is optimized while controlling pad wear rate and minimizing particle accumulation. The convex portions are formed with specific thickness ranges (0.1-10 μm) and pitch ranges (10-100 μm) to achieve the desired balance between polishing quality and particle control.
2Reliability
If the thickness of convex portions is increased, then polishing performance improves, but pad wear increases
Solution Approach 1:
The patent optimizes the thickness parameter of convex portions within a specific range (0.1-10 μm) to achieve sufficient polishing performance while controlling pad wear. This parameter optimization ensures that the convex portions are thick enough to maintain polishing effectiveness but thin enough to extend pad service life and reduce wear.
Solution Approach 2:
The patent enables dynamic adjustment of convex portion thickness and pitch to adapt to different polishing requirements. This dynamic control allows optimization of both polishing performance and pad durability for different applications, preventing excessive wear while maintaining effective polishing action.
3Manufacturing precision
If the pitch between convex portions is decreased, then surface roughness improves, but manufacturing complexity increases
Solution Approach 1:
The patent specifies an optimal pitch range (10-100 μm) that achieves sufficient surface roughness control without excessive manufacturing complexity. This parameter selection balances the need for fine surface control with the practical constraints of manufacturing processes, avoiding unnecessarily complex fabrication while achieving the desired surface quality.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design enables flexible control over the thickness and roughness of the polishing pad, reducing wear and improving polishing performance by minimizing dust and particle accumulation.
Implementation Method 1
convex portions are formed via epitaxial growth
Data Source
AI summary
In one embodiment, a dresser includes a substrate. The dresser further includes a first layer provided on the substrate. The dresser further includes at least one convex portion provided on the substrate or the first layer, having an upper end that is higher than an upper face of the first layer, and having a composition that is different from a composition of the first layer. The dresser further includes a second layer provided on the at least one convex portion.