Drop Pattern Generation for Imprint Lithography Transition Regions
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Solution Overview
Problem
Existing nano-fabrication techniques face challenges in achieving efficient and uniform drop patterns for imprint lithography and inkjet-based adaptive planarization, particularly in transition regions between uniform-feature segments, which affects the filling performance and process control.
Innovation Solution
A method and system for generating drop patterns that calculate the transition region periodicity as the least common multiple of the periodicities of adjacent uniform-feature segments, determine the number of drops based on volumetric requirements, and select a drop pattern that minimizes a weighted sum of inverse distances between drops in the transition region and adjacent uniform-feature segments.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a uniform drop pattern is used across the entire substrate, then the manufacturing process is simple, but the filling performance in transition regions deteriorates
Solution Approach 1:
The substrate surface is divided into multiple regions (uniform-feature segments and transition regions), and different drop patterns are applied to each region. Uniform drop patterns are used in uniform-feature segments while optimized drop patterns are used in transition regions, resolving the contradiction by allowing simplicity where applicable and precision where required.
Solution Approach 2:
The drop pattern is customized for each transition region based on its specific geometric characteristics and volumetric requirements. The number of drops, their positions, and their volumes are locally optimized to achieve uniform filling in transition regions without affecting the simplicity of uniform regions.
2Quantity of substance
If the number of drops in transition regions is increased to improve filling, then the volumetric requirement is met, but the uniformity with adjacent uniform-feature segments deteriorates
Solution Approach 1:
The drop pattern parameters (number of drops, drop positions, drop volumes) are dynamically adjusted based on the volumetric requirements of each transition region. By changing these parameters locally while maintaining the overall uniform drop pattern structure, the system achieves both adequate material volume and pattern uniformity.
3Manufacturing precision
If a complex drop pattern is generated for transition regions to improve filling performance, then the filling performance improves, but the device complexity increases
Solution Approach 1:
The system pre-calculates and stores optimized drop patterns for transition regions based on their geometric characteristics and volumetric requirements. During actual manufacturing, these pre-computed patterns are simply retrieved and applied, achieving high filling performance without increasing real-time device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the filling performance of both uniform-feature segments and transition regions, improving process control and throughput in nano-fabrication processes.
Implementation Method 1
A superstrate is then brought into contact with the polymerizable material, after which the material is polymerized on the substrate
Data Source
AI summary
Some devices, systems, and methods calculate a transition region periodicity as a least a common multiple of a first periodicity of a first uniform-feature segment and a second periodicity of a second uniform-feature segment; determine a plurality of periodic elements of the transition region based on the transition region periodicity; determine a number of drops for each periodic element of the plurality of periodic elements of the transition region based on a volume requirement of the periodic element; and select, for each periodic element of the plurality of periodic elements of the transition region, a transition-region drop pattern that has the number of drops and that minimizes a metric that is a weighted sum of inverse distances between drops in the periodic element and drops in the first uniform-feature segment and the second uniform-feature segment that are adjacent to the periodic element.