Droplet Recipe Correction for Template Shape Variations

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Solution Overview

Problem

Process variations in template manufacturing lead to deviations from ideal shapes, resulting in unintended patterning performance due to mismatched resist dispensing amounts in nanoimprint lithography, affecting the accuracy of semiconductor device manufacturing.

Innovation Solution

A method for generating a droplet recipe that involves measuring the actual pattern shape on the template, calculating dispensing amounts for resin based on feature data, and creating a correction map to adjust dispensing amounts for precise resist application, ensuring accurate pattern formation on the substrate.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a standard droplet recipe is used based on ideal template design, then the manufacturing process is simple, but the patterning accuracy deteriorates due to template shape deviations

Engineering Contradiction:
Improvepatterning accuracyVSAvoiddroplet recipe creation complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The invention measures the actual template shape and calculates the corrected droplet recipe in advance, before the actual imprinting process. This preliminary characterization of the template and preparation of correction data enables accurate patterning without adding complexity to the main manufacturing process.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The invention changes the parameters of the droplet recipe (droplet volume, number of droplets, dispensing positions) based on the measured actual template shape. By adjusting these parameters according to the correction map, the system compensates for template deviations and achieves accurate patterning.

Inventive Principle:
Principle #35Parameter changes

2Manufacturing precision

If the template shape deviations are not corrected, then the manufacturing process is fast, but the patterning performance becomes unintended and inaccurate

Engineering Contradiction:
Improvepattern formation accuracyVSAvoidtime for droplet recipe creation
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The template shape measurement and droplet recipe calculation are performed in advance as a preliminary step. The correction map is generated before production, allowing the actual patterning process to proceed efficiently without repeated measurements or adjustments.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The invention creates a digital correction map that copies and stores the template's actual shape characteristics. This correction map serves as a reference that guides the droplet dispensing process, eliminating the need for physical template modifications or repeated measurements.

Inventive Principle:
Principle #26Copying

3Manufacturing precision

If resist dispensing amount is not adjusted for actual template shape, then the process is simple, but the residual film thickness becomes non-uniform

Engineering Contradiction:
Improveresidual film uniformityVSAvoiddispensing control complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The invention applies different droplet volumes or numbers to different regions of the template based on local shape variations. The correction map specifies region-specific dispensing parameters that compensate for local deviations in template height or area, ensuring uniform residual film thickness across the entire patterned area.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach allows for the creation of a more appropriate droplet recipe that corresponds to the actual template shape, improving manufacturing accuracy and reducing unintended patterning issues in semiconductor device production.

Implementation Method 1

After resist is cured by irradiating with ultraviolet light

Methodology Applied
Scientific EffectPhotopolymerisation: Photopolymerisation

Data Source

PatentUS12189285B2Droplet recipe creation method, pattern formation method, and manufacturing method of semiconductor device
Publication Date: 2025.01.07 KIOXIA CORP
  • US12189285B2 patent drawing
  • US12189285B2 patent drawing
  • US12189285B2 patent drawing

AI summary

According to one embodiment, a method for generating a droplet recipe used in imprint lithography includes acquiring feature data for a pattern shape that has been formed on a template. The feature data is acquired by measuring the pattern shape of a pattern that has been formed on the template. A dispensing amount for resin to be dispensed on a substrate for filling of the pattern of the template during imprinting of the pattern of the template on the substrate is calculated, based on the acquired feature data. A dispensing amount for resin corresponding to a target thickness of a residual film formed on the substrate during the imprinting of the pattern of the template on the substrate is also calculated. A droplet recipe for dispensing of resin during imprinting of the pattern of the template is then generated based on the calculated dispensing amounts.