Drum Sputtering Device Uniform Coating
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing sputtering devices fail to uniformly deposit target atoms on particles due to the non-uniform distribution of scattered target atoms, leading to uneven coating along the axial direction of the vacuum container.
Innovation Solution
A drum sputtering device with a rotating and swingable tubular drum inside a vacuum container, equipped with a rotation mechanism and a swing mechanism, which allows for the vertical switching of end portions to ensure uniform deposition of target atoms on particles, and includes features like particle supplying and recovering chambers to maintain a vacuum state during operation, enhancing productivity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a typical sputtering device is used to sputter on particles spread on a flat container, then the device structure is simple, but the target atoms are deposited only on the upper surfaces of particles resulting in non-uniform coating
Solution Approach 1:
The drum is designed to perform both rotation around its axis and swinging motion in the axial direction. The rotation stirs the particles while the swinging motion reciprocates particles between end portions, creating dynamic particle movement that enables uniform deposition of target atoms on all particle surfaces.
Solution Approach 2:
The invention transitions from a static flat container to a three-dimensional drum structure with internal particle circulation. The drum's rotation and swinging create multi-dimensional particle movement paths, allowing target atoms to reach all particle surfaces including previously inaccessible lower and side surfaces.
2Manufacturing precision
If the drum is rotated at high speed to stir particles, then particle mixing is improved, but target atoms may fall off from particles due to excessive collision
Solution Approach 1:
The drum performs periodic swinging motions that alternately incline and level the drum axis. This periodic action creates controlled particle circulation patterns, allowing particles to be gently stirred during rotation while being periodically redistributed to prevent excessive collision and target atom loss.
3Ease of operation
If the drum is inclined to discharge particles, then particle recovery is simplified, but additional discharge mechanisms are required
Solution Approach 1:
The drum's swinging mechanism serves dual purposes: during sputtering, it reciprocates particles to ensure uniform coating; during recovery, it inclines the drum to discharge particles. This multi-functionality eliminates the need for separate discharge mechanisms while simplifying particle recovery operations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The drum sputtering device achieves uniform deposition of target atoms on all surfaces of particles, simplifies the recovery process, and maintains a vacuum state for repeated sputtering cycles, preventing target atoms from falling off and enhancing joint strength through controlled oxygen supply.
Implementation Method 1
a sputtering target that is arranged inside the drum... target atoms sputtering from the sputtering target
Implementation Method 2
a rotation mechanism arranged to rotate the drum around the axis of the drum... particles are stirred by rotating the drum
Implementation Method 3
a swing mechanism arranged to swing the drum so that, in use, one end portion and the other end portion in the axial direction of the drum are relatively vertically switched... particles can be reciprocated in the axial direction of the drum
Implementation Method 4
a vacuum container arranged to contain particles... apparatus for depositing material upon powder is disclosed in Patent Literature 3, which apparatus comprises a tubular container, means for evacuating
Data Source
Figure 1
Figure 2
Figure 3(a)~3(c)
AI summary
A drum sputtering device that can uniformly deposit target atoms on all over particles is provided. The drum sputtering device includes a vacuum container 2 that contains particles, a tubular drum 10 that is arranged inside the vacuum container 2 and at least one end face 10c of which is open, and a sputtering target 16 that is arranged inside the drum 10. With a supporting arm 11, a drive motor 12 for rotation, a drive motor 13 for swing, a first gear member 14, and a second gear member 15, the drum can be rotated around the axis of the drum 10 and the drum 10 can be swung so that one end portion 10e and the other end portion 10f in the axial direction of the drum 10 are relatively vertically switched.