Exhaust Sensor Feedback for Deposition Tool Dry-Clean Control
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Solution Overview
Problem
Current techniques for monitoring the dry-clean operation in semiconductor processing tools are inefficient, requiring multiple read points and excessive use of cleaning gases, leading to inaccurate cleanliness assessment and potential damage to the tools.
Innovation Solution
A cleaning-control subsystem equipped with a gas concentration sensor and a temperature sensor in the exhaust system of the deposition tool monitors the dry-clean operation, providing data to determine the efficiency and effectiveness of the process, allowing for precise control and reduced gas consumption.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If multiple read points are used to monitor dry-clean operation, then measurement coverage is improved, but device complexity and time consumption increase
Solution Approach 1:
The patent combines multiple monitoring functions (gas concentration detection and temperature detection) into a single integrated monitoring system located in the exhaust system. This merging approach provides comprehensive cleanliness assessment without requiring multiple separate read points throughout the processing chamber, thus improving measurement coverage while avoiding the complexity and time consumption of multiple distributed sensors.
2Measurement precision
If multiple read points are used to monitor dry-clean operation, then measurement coverage is improved, but time consumption increases
Solution Approach 1:
The monitoring system provides continuous real-time monitoring of gas concentration and temperature in the exhaust system during the dry-clean operation. This continuous monitoring approach eliminates the need for sequential measurements at multiple read points, providing comprehensive cleanliness assessment instantly without time consumption associated with moving between multiple measurement locations.
3Reliability
If excessive cleaning gas is used, then cleaning effectiveness is improved, but loss of substance and cost increase
Solution Approach 1:
The system uses real-time feedback from gas concentration sensors and temperature sensors in the exhaust system to monitor the dry-clean operation progress. Based on this feedback, the system can determine when the cleaning is complete and adjust or terminate gas flow accordingly. This feedback mechanism ensures effective cleaning while preventing excessive cleaning gas consumption by stopping the process at the optimal point.
4Productivity
If traditional monitoring methods are used, then simplicity is maintained, but productivity decreases due to increased downtime
Solution Approach 1:
The patent replaces traditional mechanical monitoring methods (such as visual inspection or physical sampling) with electronic sensing technology. Gas concentration sensors and temperature sensors automatically detect cleaning progress in real-time, eliminating the need for manual intervention and reducing downtime. This substitution of electronic detection for mechanical monitoring significantly improves productivity by enabling faster, automated cleanliness verification.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the accuracy of the dry-clean operation, reduces cleaning gas consumption, decreases downtime, and increases the yield and throughput of semiconductor products.
Implementation Method 1
A cleaning-control subsystem equipped with a gas concentration sensor and a temperature sensor in the exhaust system of the deposition tool monitors the dry-clean operation
Implementation Method 2
A cleaning-control subsystem equipped with a gas concentration sensor and a temperature sensor in the exhaust system of the deposition tool monitors the dry-clean operation
Implementation Method 3
a foreline connected to a gas outlet of the deposition chamber
Data Source
AI summary
Some implementations described herein provide techniques and apparatuses for determining a performance of a dry-clean operation within a deposition tool. A cleaning-control subsystem of the deposition tool may include a gas concentration sensor and a temperature sensor mounted in an exhaust system of the deposition tool to monitor the dry-clean operation. The gas concentration sensor may provide data related to a concentration of a chemical compound in a cleaning gas, where the chemical compound is a bi-product of the dry-clean operation. The temperature sensor may provide temperature data related to an exothermic reaction of the dry-clean operation. Such data may be used to determine an efficiency and/or an effectiveness of the dry-clean operation within the deposition tool.