Drying Chuck Layout for Uniform Supercritical Substrate Drying
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Solution Overview
Problem
Current substrate processing technologies face challenges in improving fluidity of supercritical fluids, ensuring uniform drying, preventing mechanical damage during substrate handling, and facilitating efficient substrate insertion and processing.
Innovation Solution
A substrate processing apparatus with a drying chamber housing and a drying chuck design that includes multiple supporting members and guide members, allowing for effective supercritical fluid spraying and exhaustion, ensuring uniform distribution and preventing mechanical damage during substrate handling.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the distance between supporting members is increased to improve supercritical fluid fluidity and exhaustion, then the drying uniformity is improved, but the device structure becomes more complex and occupies more space
Solution Approach 1:
The drying chamber is divided into an upper chamber and a lower chamber with distinct functions. The upper chamber houses the drying chuck with supporting members for substrate processing, while the lower chamber provides space for fluid exhaustion and contains the exhaust nozzle. This segmentation allows optimal positioning of components without increasing overall structural complexity.
Solution Approach 2:
The patent utilizes vertical spatial arrangement by positioning the exhaust nozzle at the bottom of the lower chamber, creating a three-dimensional fluid flow path from the substrate surface upward through the upper chamber and out through the lower chamber. This dimensional approach improves fluidity and exhaustion efficiency without requiring increased horizontal distances between supporting members.
2Productivity
If the drying chamber is divided into upper and lower chambers to improve fluid exhaustion, then the supercritical fluid removal efficiency is improved, but the device complexity increases
Solution Approach 1:
The drying chamber is segmented into an upper chamber for substrate processing and a lower chamber for fluid exhaustion. The upper chamber contains the drying chuck and supports the substrate, while the lower chamber houses the exhaust nozzle and provides a dedicated space for supercritical fluid removal. This functional segmentation improves exhaustion efficiency by creating separate zones for different operations.
Solution Approach 2:
The lower chamber serves multiple functions: it provides structural support for the upper chamber, contains the exhaust nozzle for fluid removal, and acts as a collection space for exhausted supercritical fluid. This multi-functionality improves productivity without proportionally increasing device complexity.
3Stability of the object's composition
If multiple supporting members are used to hold the substrate, then the substrate handling stability is improved, but the risk of mechanical damage from collision increases
Solution Approach 1:
The supporting members are positioned at specific locations on the substrate surface rather than providing uniform support across the entire substrate. This localized support strategy provides sufficient stability for processing while minimizing the number of supporting members that could potentially cause mechanical damage during collision.
Solution Approach 2:
The drying chamber is designed with sufficient clearance space between the substrate and chamber walls, and between supporting members and chamber components. This pre-established spatial buffer prevents direct collision between the substrate/supporting members and chamber structures, reducing mechanical damage risk before collisions can occur.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus enhances fluidity and uniform drying of substrates, prevents mechanical damage, and facilitates smooth substrate insertion, thereby improving the efficiency and stability of the substrate processing process.
Implementation Method 1
spraying a supercritical fluid toward the substrate
Data Source
AI summary
A substrate processing apparatus includes a drying chamber housing and a drying chuck in the drying chamber housing. The drying chamber housing includes a lower chamber and an upper chamber attached to the lower chamber. The drying chuck includes first, second, and third supporting members, each connected to the upper chamber and spaced apart from the lower chamber in a first direction. The first supporting member includes a first rod secured to the upper chamber, a first block extending outward from the first rod in a first direction, and a first pin on the first block. The second supporting member includes a second rod secured to the upper chamber, a second block extending outward from the second rod in a second direction, and a second pin on the second block. A distance between the first rod and the second rod may be equal to or larger than 301 mm.