Supercritical Drying Supply Line Heating for Pattern Collapse
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Solution Overview
Problem
Current substrate drying processes in semiconductor manufacturing, especially for fine circuit patterns with line widths less than 30 nm, face inefficiencies in drying efficiency and pattern collapse due to temperature deviations and inadequate maintenance of processing conditions during supercritical fluid use.
Innovation Solution
A substrate processing apparatus and method that include a chamber body for supercritical drying, a substrate support chuck, a fluid supply unit with a heated supply line, and a supply line heating unit to maintain a consistent supercritical process by adjusting the temperature of the processing fluid and minimizing temperature deviations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional drying process with isopropyl alcohol is used, then the substrate can be dried, but drying efficiency is low and pattern collapse occurs for fine circuit patterns with line width equal to or less than 30 nm
Solution Approach 1:
The patent changes the physical parameters of the drying fluid by using supercritical carbon dioxide instead of conventional isopropyl alcohol. The supercritical state is achieved by controlling temperature and pressure parameters, which fundamentally alters the fluid's properties to enable effective drying of fine patterns without causing pattern collapse.
Solution Approach 2:
The patent utilizes phase transitions of carbon dioxide, transitioning it to a supercritical state for drying and then allowing it to decompress and return to gaseous state. This phase transition mechanism enables the fluid to penetrate fine patterns effectively and evaporate without causing surface tension-related damage to the circuit patterns.
2Productivity
If supercritical fluid is used for drying, then drying efficiency improves, but temperature deviation occurs affecting consistent substrate processing conditions
Solution Approach 1:
The patent implements preliminary heating of the fluid supply line before the actual supercritical drying process. By pre-heating the supply line to the required temperature, the system ensures that when the carbon dioxide flows through, it maintains the correct temperature for supercritical state, preventing temperature deviation during the drying process and ensuring consistent processing conditions.
Solution Approach 2:
The patent incorporates temperature sensing and control mechanisms that monitor the temperature of the fluid supply line and adjust heating accordingly. This feedback control ensures the supply line maintains the precise temperature required for supercritical fluid delivery, correcting any deviations and maintaining consistent substrate processing conditions throughout the drying process.
3Device complexity
If supercritical process is performed without supply line heating, then the process is simpler, but temperature deviation increases affecting processing consistency
Solution Approach 1:
The patent adds a preliminary heating step for the fluid supply line, which is performed before the actual drying process begins. This preliminary action ensures the supply line is pre-conditioned to the required temperature, preventing temperature deviation during operation while maintaining relatively simple overall process structure.
Solution Approach 2:
The patent introduces a heating medium as an intermediary between the heat source and the carbon dioxide fluid. This intermediary heating mechanism allows for controlled and uniform heating of the fluid supply line, ensuring temperature consistency without requiring direct heating of the carbon dioxide, thus maintaining process simplicity while achieving temperature stability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution reduces the time required for the supercritical process, maintains consistent substrate processing conditions, and minimizes damage to the substrate by maintaining the supercritical atmosphere effectively, thereby enhancing drying efficiency and preventing pattern collapse.
Implementation Method 1
a supply line heating unit configured to heat the fluid supply line... the supply line heating unit is configured to be operated so that the fluid supply line is heated by allowing the heating fluid in which a temperature thereof is increased in an idle mode to flow to the fluid supply line
Implementation Method 2
a chamber heater configured to heat the processing space to a temperature equal to or more than a critical temperature of the drying fluid
Implementation Method 3
the fluid supply line is heated by allowing the heating fluid in which a temperature thereof is increased in an idle mode to flow to the fluid supply line
Data Source
AI summary
A substrate processing apparatus includes a chamber body providing a processing space for drying a substrate with a drying fluid in a supercritical state, a substrate support chuck supporting the substrate in the processing space, a fluid supply unit including a fluid supply line configured to supply the drying fluid to the processing space, and a supply line heating unit configured to heat the fluid supply line.