Dual-Actuator Imprint Force Control via Segmentation
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Solution Overview
Problem
In nano-fabrication processes, particularly in imprint lithography, there is a challenge in achieving precise and stable force control, especially when transitioning between high and low magnitude forces, which can lead to errors and misalignments during the filling of features and polymerization of materials.
Innovation Solution
A dual-actuation system with independent control loops is employed, where a first actuator applies a high magnitude force and a second actuator applies a low magnitude force, allowing for precise control and minimizing errors by using a common controller to manage both forces based on the current state of the process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a single actuator is used to apply force to the imprint lithography template, then the device complexity is reduced, but the force control precision deteriorates when transitioning between high and low magnitude forces
Solution Approach 1:
The actuator system is segmented into two independent actuators: a first actuator for applying high magnitude forces and a second actuator for applying low magnitude forces. Each actuator operates within its optimal force range, enabling precise force control across the entire spectrum from low to high forces without requiring a single complex actuator to handle all force levels.
Solution Approach 2:
The system dynamically switches between the first and second actuators based on the required force magnitude. The controller selects which actuator to use depending on whether high or low force is needed, allowing the system to adapt its configuration optimally for each operating condition and maintain high control precision throughout the force range.
2Reliability
If high magnitude force is applied during filling and polymerization, then the imprint lithography template contacts the imprint resist effectively, but force control stability deteriorates leading to errors and misalignments
Solution Approach 1:
The system changes the force parameter dynamically by switching between two actuators with different force capabilities. During initial contact, the first actuator applies high magnitude force to ensure effective contact. During filling and polymerization, the system transitions to the second actuator that applies only low magnitude force, maintaining stability and preventing control errors while still ensuring proper template-resist contact.
3Manufacturing precision
If a dual-actuator system with independent control loops is used, then the force control precision is improved, but the device complexity increases
Solution Approach 1:
The control system is segmented into two independent control loops, each dedicated to controlling one actuator. This segmentation allows each control loop to be optimized for its specific actuator and force range, simplifying the control logic within each loop while achieving high overall precision through the coordinated operation of both actuators.
Data Source
AI summary
Methods, systems, and apparatus for applying an imprinting force to an imprint lithography template, including providing, by a controller using a first control loop, a first control signal to a first actuator associated with the first control loop; providing, by the controller using a second control loop, a second control signal to a second actuator associated with the second control loop, wherein the second control loop and the first control loop are different; and applying, to the imprint lithography template, at least one of: a first force by the first actuator in response to the first control signal, and a second force by the second actuator in response to the second control signal.