Dual-Antenna Plasma Generator for Substrate Treatment
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Solution Overview
Problem
Current substrate treating apparatuses face inefficiencies in plasma excitation and heat control during the plasma generation process, which can lead to unstable plasma states and excessive energy usage.
Innovation Solution
A substrate treating apparatus with a plasma generating unit that includes a first antenna and a second antenna, where the second antenna is connected in parallel to the first antenna only after a preset time or when current/voltage deviations stabilize, allowing for controlled plasma ignition and heat management.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a single antenna is used for plasma generation, then the device structure is simple, but plasma excitation efficiency is insufficient and plasma state stability is poor
Solution Approach 1:
The antenna system is segmented into a first antenna and a second antenna that operate at different stages. The first antenna is used during the ignition phase, and the second antenna is used during the stable operation phase. This segmentation allows each antenna to be optimized for its specific function, improving overall plasma excitation efficiency while maintaining manageable structural complexity.
Solution Approach 2:
The antenna system dynamically switches between the first antenna and the second antenna based on the plasma generation stage. The controller activates the first antenna during ignition and then switches to the second antenna once plasma is established. This dynamic operation optimizes plasma excitation efficiency at different stages without requiring both antennas to operate simultaneously, thus controlling device complexity.
2Speed
If high power is applied for rapid plasma ignition, then ignition speed is fast, but excessive heat is generated that can damage the substrate
Solution Approach 1:
The first antenna is used to preliminarily ignite the plasma at low power before the main processing begins. This preliminary ignition action establishes the plasma in a controlled manner, avoiding the need for high-power ignition that would generate excessive heat. Once plasma is established, the second antenna takes over for stable operation, maintaining temperature control throughout the process.
Solution Approach 2:
The plasma generation process uses periodic action by switching between two distinct phases: an ignition phase using the first antenna and a stable operation phase using the second antenna. This periodic switching allows rapid ignition without sustained high heat generation, as the high-power phase is brief and followed by a stable, lower-power phase.
3Productivity
If the second antenna is connected in parallel with the first antenna, then plasma excitation efficiency is improved, but heat generation increases and plasma stability decreases
Solution Approach 1:
The system dynamically controls the connection state of the second antenna, connecting it in parallel with the first antenna only during the stable operation phase after plasma ignition. During the ignition phase, only the first antenna is active. This dynamic control allows the system to benefit from the improved plasma excitation efficiency of parallel connection when needed, while avoiding plasma instability that would result from continuous parallel operation during all phases.
Solution Approach 2:
The controller maintains continuous useful action by seamlessly transitioning from the first antenna during ignition to the second antenna during stable operation. This continuous control ensures that plasma excitation efficiency is maintained throughout the process while plasma stability is preserved by using the appropriate antenna for each operational phase, avoiding the disruptions that would occur with abrupt or continuous parallel operation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables efficient plasma excitation with improved plasma density and reduced heat generation, enhancing the substrate treatment process by stabilizing plasma states and optimizing energy usage.
Implementation Method 1
The antenna member generates electromagnetic fields. The generated electromagnetic fields excite a process gas into a plasma state.
Implementation Method 2
a second antenna wound around the plasma generating chamber and connected to the power source through an auxiliary electric wire
Implementation Method 3
The generated electromagnetic fields excite a process gas into a plasma state
Data Source
AI summary
Disclosed are a substrate treating apparatus, a substrate treating method, and a plasma generating unit. The substrate treating apparatus includes a housing configured to provide a treatment space, in which a substrate is treated, a support unit configured to support a substrate in the treatment space, a plasma generating unit disposed outside the housing and configured to excite plasma from a gas and supply the excited plasma to the treatment space, and a controller, wherein the plasma generating unit includes a plasma generating chamber having a space, into which a gas is introduced, a first antenna wound to surround the plasma generating chamber and connected to a power source through an electric wire, a second antenna wound around the plasma generating chamber and connected to the power source through an auxiliary electric wire, and a switch configured to switch on and off the auxiliary electric wire.