Dual Antenna Plasma Source for Impedance Mismatch
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Solution Overview
Problem
Inductively coupled plasma-generating devices face challenges in achieving uniform plasma generation when different frequencies are applied to a single coil, leading to impedance mismatch and unstable discharge.
Innovation Solution
A plasma-generating device with a single coil-based plasma source that includes two concentric ring-shaped antennas, connected in a specific configuration, and powered by both high and low frequency supplies, along with matching circuitry and filters to manage impedance and ensure uniform power distribution, allowing for stable plasma generation across a wide frequency range.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a long coil is used to solve impedance mismatch when applying two different frequencies, then plasma uniformity is improved, but sufficient inductance cannot be secured and discharge cannot be performed properly
Solution Approach 1:
The single coil is divided into two separate coils: a first coil for high frequency power and a second coil for low frequency power. This segmentation allows each coil to be optimized for its specific frequency, ensuring sufficient inductance for proper discharge while maintaining plasma uniformity through controlled power distribution.
Solution Approach 2:
Different regions of the plasma generation system are assigned different functional qualities: the first coil region handles high frequency excitation while the second coil region handles low frequency excitation. This local differentiation enables each coil to provide the appropriate inductance for its operating frequency, resolving the impedance mismatch problem without requiring an excessively long single coil.
2Manufacturing precision
If two different frequencies are applied to a single coil to improve plasma uniformity, then plasma uniformity is improved, but impedance mismatch occurs due to frequency difference
Solution Approach 1:
The system segments the electromagnetic excitation into two separate coils, each dedicated to a specific frequency. The first coil is optimized for high frequency operation while the second coil is optimized for low frequency operation, eliminating the impedance mismatch that would occur if both frequencies were applied to a single coil.
Solution Approach 2:
The dual-coil configuration provides multi-functionality by enabling the plasma generation system to operate with different frequency combinations. The first and second coils can be independently controlled to provide high frequency, low frequency, or combined frequency excitation, allowing optimization for different plasma uniformity requirements while maintaining impedance matching for each frequency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables stable and uniform plasma generation, improving the reliability of substrate treatment processes by maintaining plasma uniformity and preventing impedance issues, even with different frequencies applied to a single coil.
Implementation Method 1
a first power supply for supplying high frequency power; a single coil-based plasma source including at least two antennas wherein the first power supply is connected to the first antenna at a point thereof adjacent to the grounded end to receive the high frequency power
Implementation Method 2
a second power supply for supplying low frequency power; a second antenna surrounded by the first antenna, wherein the second antenna has one end connected to the first antenna and the other end as a low frequency power receiving end connected to the second power supply
Implementation Method 3
a gas supply for supplying a gas, wherein the gas is excited into plasma by the single coil-based plasma source
Data Source
AI summary
Disclosed is an inductively-coupled plasma-generating device including: a first power supply for supplying high frequency power; a second power supply for supplying low frequency power; a single coil-based plasma source including at least two antennas which comprise a first antenna having one end as a grounded end and the other end, wherein the first power supply is connected to the first antenna at a point thereof adjacent to the grounded end to receive the high frequency power; and a second antenna surrounded by the first antenna, wherein the second antenna has one end connected to the first antenna and the other end as a low frequency power receiving end connected to the second power supply; and a gas supply for supplying a gas, wherein the gas is excited into plasma by the single coil-based plasma source.