Dual Particle Beam Deflection for Clear Interaction Separation
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing particle beam devices face challenges in simultaneously guiding electron and ion beams due to disturbing influences from electrostatic and magnetic fields, which complicates imaging and analysis by blurring the differentiation between interaction particles caused by each beam.
Innovation Solution
A system that controls the deflection of particle beams to position one beam off the object while the other is in use, allowing for continuous imaging and processing without pauses, by using separate deflection devices and control units for each beam, enabling faster and more accurate data collection.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If both electron beam and ion beam are supplied simultaneously onto the object, then imaging and processing can occur concurrently, but disturbing influences arise that affect beam path and make differentiation of interaction particles difficult
Solution Approach 1:
The patent applies preliminary action by deflecting the electron beam away from the object before the ion beam processing begins. The control unit coordinates the timing so that the electron beam is positioned at a first position (off the object) prior to ion beam interaction, preventing disturbing influences on interaction particle detection while maintaining the ability to observe the object during ion beam processing
2Productivity
If electron beam and ion beam are supplied at the same time, then simultaneous imaging and processing is enabled, but electrostatic and magnetic fields from objective lenses disturb the other beam's path
Solution Approach 1:
The control unit performs preliminary deflection of the electron beam to a first position away from the object before ion beam processing starts. This timing coordination ensures that the electron beam does not experience disturbing electrostatic and magnetic fields from the ion beam's objective lens, maintaining beam path stability while enabling sequential operation
Solution Approach 2:
The patent implements dynamic beam positioning where the electron beam can be rapidly switched between a first position (off the object during ion processing) and a second position (on the object for observation). The deflection devices and control unit enable real-time adjustment of beam positions to optimize operation conditions and avoid mutual interference
3Productivity
If electron beam is used to observe ion beam processing, then real-time monitoring is achieved, but disturbing influences from electron beam affect ion beam imaging quality
Solution Approach 1:
The control unit deflects the electron beam to a first position away from the object before ion beam processing begins. This preliminary positioning prevents the electron beam from creating disturbing electrostatic and magnetic fields that would degrade ion beam image quality, while still allowing observation capability when the electron beam is positioned at the second location
Solution Approach 2:
The patent employs periodic switching of the electron beam between positions: during ion beam processing, the electron beam is positioned away from the object to avoid interference, and between processing cycles, it can be positioned on the object for observation. This periodic action maintains both observation capability and image quality
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces disturbing influences, allows for faster imaging and analysis, and enables clear differentiation between interaction particles from each beam, improving the quality and efficiency of particle beam device operations.
Implementation Method 1
guiding the first particle beam over the object... using a first deflection device
Implementation Method 2
guiding the first particle beam over the object... using a first deflection device
Implementation Method 3
at least one first objective lens for focusing the first particle beam onto the object
Implementation Method 4
at least one first objective lens for focusing the first particle beam onto the object
Implementation Method 5
at least one first beam generator for generating a first particle beam with first charged particles
Implementation Method 6
at least one first beam generator for generating a first particle beam with first charged particles
Data Source
AI summary
Imaging, processing and/or analyzing an object using a particle beam device includes guiding a first particle beam over the object, processing the object using the first particle beam or detecting first interaction particles and/or a first interaction radiation, where the first interaction particles and/or the first interaction radiation results/result from an interaction of the first particle beam with the object, controlling a second deflection device for guiding the second particle beam over the object even while the first particle beam is being guided over the object, and deflecting the first particle beam from the object. Only when the first particle beam has been deflected, the object is processed using the second particle beam or detecting second interaction particles and/or a second interaction radiation that results/result from an interaction of the second particle beam with the object.