Dual-Chamber ICP Plasma Reactor Assembly for Robust Coupling
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Solution Overview
Problem
Existing plasma reactors for semiconductor manufacturing exhaust gas processing using inductively coupled plasma lack structural robustness and convenient assembly methods.
Innovation Solution
A plasma reactor design featuring a ferrite core assembly with stacked ferrite cores and a dual-chamber structure connected by coupling rods, allowing for improved structural integrity and ease of assembly.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a plasma reactor for inductively coupled plasma is designed with a conventional structure, then it can process exhaust gas, but the structural robustness is insufficient and assembly is inconvenient
Solution Approach 1:
The plasma reactor is divided into multiple modular components including a chamber assembly, a ferrite core assembly, and an antenna assembly. These segmented modules can be manufactured separately and assembled through coupling structures, improving both structural robustness through precise modular connections and assembly convenience through standardized interfaces.
2Strength
If the plasma reactor uses a monolithic structure, then structural integrity is maintained, but manufacturing complexity and assembly difficulty increase
Solution Approach 1:
Multiple functional components are merged into integrated assemblies. The chamber assembly integrates the processing chamber with coupling structures, the ferrite core assembly combines the ferrite core with mounting features, and the antenna assembly integrates the antenna with support structures. This merging approach maintains structural integrity while reducing manufacturing complexity compared to a fully monolithic design.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The design provides a robust and easily assembled plasma reactor for inductively coupled plasma, enhancing workability and manufacturing efficiency in processing semiconductor manufacturing exhaust gases.
Implementation Method 1
when radio frequency power is applied to the antenna coil, a magnetic field is induced by a time-varying current flowing through the antenna coil, thereby generating plasma by an electric field generated inside the chamber
Implementation Method 2
a ferrite core coupled to surround the chamber, an antenna coil wound around the ferrite core
Data Source
AI summary
A plasma reactor for inductively coupled plasma includes: a ferrite core assembly including a ferrite core stacked body including a plurality of ferrite cores stacked and a first passage portion and a second passage portion arranged in parallel, and a ferrite core accommodating structure; a first chamber body including a first base portion configured to provide a first internal space therein, a first A-extension pipe extending from the first base portion, communicating with the first internal space and accommodated in the first passage portion, and a second A-extension pipe extending from the first base portion; and a second chamber body including a second base portion configured to provide a second internal space therein, a first B-extension pipe extending from the second base portion, and a second B-extension pipe extending from the second base portion.