Dual-Chamber Laser Beam Combining for Wavelength-Flexible Lithography
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Solution Overview
Problem
Existing lithographic systems face challenges in achieving flexible wavelength switching and higher power illumination, particularly in 3D NAND lithography, due to the need for greater depth of focus and higher power requirements, which are not efficiently met by current laser systems.
Innovation Solution
A laser system with two independent laser chambers, allowing for spatial or temporal overlap of beams to provide higher power and wavelength flexibility, with shared ancillary systems to reduce operational costs and increase service intervals.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a single laser chamber is used, then device complexity is reduced, but wavelength flexibility and power delivery are limited
Solution Approach 1:
The patent combines multiple laser chambers (e.g., KrF and ArF laser chambers) into a single integrated system with shared ancillary components such as gas supply systems, cooling systems, and control systems. This merging approach enables wavelength flexibility by allowing the system to operate at different wavelengths while reducing overall device complexity through component sharing.
Solution Approach 2:
The laser system is designed with multi-functionality where a single system can generate multiple wavelengths and operate in different modes (single chamber or dual chamber operation). The shared ancillary systems serve multiple functions across different laser chambers, enabling the system to adapt to various lithographic requirements without requiring separate dedicated systems for each wavelength.
2Power
If multiple laser chambers are used, then power delivery and repetition rate are increased, but device complexity increases
Solution Approach 1:
Multiple laser chambers are merged into a single integrated system where ancillary components like gas supply, cooling, and control systems are shared. This allows the system to achieve higher power delivery and effective repetition rates through dual chamber operation while minimizing the increase in device complexity by avoiding duplication of non-critical components.
3Reliability
If all components are duplicated for dual chamber operation, then reliability is increased, but cost and operational complexity increase
Solution Approach 1:
The system merges multiple laser chambers with shared ancillary components rather than duplicating all components. Critical components that directly affect laser performance (such as the laser chambers themselves) are duplicated, while support systems (gas supply, cooling, control) are shared. This approach maintains system reliability through redundancy where needed while reducing operational complexity and cost by avoiding unnecessary duplication.
4Adaptability or versatility
If wavelength is changed rapidly, then adaptability is improved, but system stability deteriorates
Solution Approach 1:
The system prepares for wavelength changes by having multiple laser chambers pre-configured with different wavelength capabilities. When a wavelength change is needed, the system can switch between pre-prepared chambers rather than attempting to rapidly retune a single chamber, thereby maintaining system stability while achieving rapid wavelength switching capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system enables single-pass exposure with multiple wavelengths, doubling effective repetition rates and power delivery without duplicating all components, thus improving throughput and power efficiency in lithographic processes.
Implementation Method 1
a first laser chamber module adapted to generate a first beam of laser radiation at a first wavelength
Implementation Method 2
a first laser chamber module adapted to generate a first beam of laser radiation
Implementation Method 3
a second laser chamber module adapted to generate a second beam of laser radiation at a second wavelength different from the first wavelength
Implementation Method 4
a second laser chamber module adapted to generate a second beam of laser radiation
Implementation Method 5
a beam combiner arranged to receive the first beam and the second beam and adapted to propagate the first beam and the second beam along a common output beam path
Data Source
AI summary
Apparatus for and method of generating multiple laser beams using multiple laser chambers. The relative timing of the beams is controllable so they may, for example, be interleaved, may overlap, or be prevented from overlapping, or may occur in rapid sequence. The beams may have different spectral and power characteristics such as different wavelengths. Also disclosed is a system in which at least one of the multiple laser chambers is configured to generate radiation of two different wavelengths.