Dual Circulation Filtration Layout for Cleaner Processing Liquid
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing liquid processing apparatuses do not effectively improve the cleanliness of processing liquids, particularly in semiconductor wafer processing systems, where contaminants can lead to substrate defects and reduced processing efficiency.
Innovation Solution
A liquid processing apparatus with a dual circulation line system, where the second circulation line has a shorter flow path and lower flow rate than the first, and incorporates smaller filters to enhance filtration efficiency, ensuring improved cleanliness of the processing liquid by effectively removing foreign substances.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a single circulation line with filters is used, then the system structure is simple, but the cleanliness of the processing liquid is insufficient
Solution Approach 1:
The circulation line is divided into two separate circulation lines (first and second circulation lines), each with its own filters. This segmentation allows independent filtration paths, enabling better control over liquid cleanliness without overwhelming system complexity. Each circulation line can be optimized for specific filtration requirements.
Solution Approach 2:
The patent introduces a multi-dimensional approach by creating circulation lines with different characteristics (length, flow rate, filtration capacity). The first circulation line has longer path and higher flow rate, while the second has shorter path and lower flow rate, allowing comprehensive filtration through dimensional differentiation.
2Manufacturing precision
If the circulation line flow path is long, then filtration is more thorough, but the system size increases
Solution Approach 1:
The filtration function is segmented across two circulation lines with different path lengths. The first circulation line provides extended filtration path for thorough cleaning, while the second provides compact filtration. This segmentation allows the system to achieve comprehensive filtration without requiring all components to be large-scale.
Solution Approach 2:
Different regions of the circulation system have different characteristics optimized for their specific functions. The first circulation line has longer path length suited for primary filtration, while the second circulation line has shorter path suited for secondary polishing filtration, allowing each local region to excel at its specific filtration task.
3Productivity
If high flow rate is used in circulation line, then processing efficiency is improved, but filtration quality deteriorates
Solution Approach 1:
The circulation system is segmented into two lines with different flow rate characteristics. The first circulation line operates at higher flow rate for efficient liquid circulation, while the second circulation line operates at lower flow rate for superior filtration quality. This segmentation allows the system to simultaneously achieve both high productivity and high filtration quality.
Solution Approach 2:
The system applies partial filtration action at different flow rates through two separate circulation lines. Rather than attempting to achieve both high flow rate and high filtration quality in a single line, the system divides the filtration action into two parts, each optimized for its specific flow rate requirement.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The dual circulation line system enhances the cleanliness of processing liquids by efficiently removing contaminants, improving the quality of the liquid and reducing the risk of substrate defects, while also minimizing system size and operational complexity.
Implementation Method 1
a first circulation line configured to cause the processing liquid sent from the storage tank to pass through a first filter and to return to the storage tank; and a second circulation line connected to the first circulation line and configured to cause the processing liquid to pass through a second filter
Data Source
AI summary
A liquid processing apparatus includes: a storage tank that stores a processing liquid; a first circulation line that causes the processing liquid sent from the storage tank to pass through a first filter and to return to the storage tank; and at least one second circulation line that causes the processing liquid to pass through a second filter and to return to the storage tank, wherein the second circulation line is shorter in a flow path than the first circulation line, a second flow rate of the processing liquid flowing into the second circulation line is smaller than a first flow rate of the processing liquid flowing into the first circulation line at a downstream side of a location where the first circulation line and the second circulation line are joined, and the second filter is smaller in a filtration amount per unit time than the first filter.