Dual Cup-Wheel Grinding for Accurate Large-Substrate Finishing
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Solution Overview
Problem
Existing substrate grinding methods struggle to efficiently and accurately grind large-size mounting substrates with warpage, such as wafer level packages (WLP) and panel level packages (PLP), due to increased processing time, excessive wear on grinding wheels, and the need for multiple grinding devices, which complicates high-accuracy finish grinding.
Innovation Solution
A substrate grinding device and method utilizing a cup wheel-type first and second grinding wheels that simultaneously grind the substrate without changing its position, with the first wheel performing coarse grinding and the second wheel performing finish grinding, reducing the size of the device and grinding time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single grinding wheel is used for substrate grinding, then the device complexity is reduced, but the manufacturing precision deteriorates due to inability to perform both coarse and finish grinding simultaneously
Solution Approach 1:
The patent combines two grinding wheels (first grinding wheel for coarse grinding and second grinding wheel for finish grinding) into a single substrate grinding device, allowing both coarse and finish grinding to be performed simultaneously on the same substrate without requiring separate devices or sequential processing steps
2Manufacturing precision
If multiple grinding devices are used for coarse and finish grinding, then the manufacturing precision is improved, but the device complexity increases
Solution Approach 1:
The patent merges the functionality of separate coarse grinding device and finish grinding device into a single integrated substrate grinding device with multiple grinding wheels, eliminating the need for multiple independent devices while maintaining both coarse and finish grinding capabilities
3Manufacturing precision
If sequential grinding (coarse then finish) is performed, then the manufacturing precision is improved, but the processing time increases
Solution Approach 1:
The patent enables continuous simultaneous grinding by operating both the first grinding wheel (coarse grinding) and second grinding wheel (finish grinding) at the same time on the substrate, eliminating the idle time between sequential coarse and finish grinding operations
Solution Approach 2:
The first grinding wheel performs coarse grinding to remove material and prepare the substrate surface in advance, while the second grinding wheel simultaneously performs finish grinding, so that by the time coarse grinding is complete, finish grinding is already underway or complete
4Ease of manufacture
If traditional substrate grinding method is used, then the processing is simple, but the productivity deteriorates due to long processing time
Solution Approach 1:
The patent maintains process simplicity while dramatically improving productivity by enabling continuous simultaneous grinding with multiple wheels, where both coarse and finish grinding operations occur concurrently rather than sequentially, reducing total processing time without complicating the overall process flow
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method allows for efficient and high-accuracy grinding of large-size substrates with reduced grinding time and grinding wheel wear, achieving a ½ reduction in processing time and ⅓ reduction in wheel costs compared to single-wheel grinding methods.
Implementation Method 1
a work table rotatable with the work table sucking and holding a substrate
Implementation Method 2
a cup wheel-type first grinding wheel configured to grind the rotating substrate while rotating
Data Source
AI summary
Provided is a substrate grinding device including: a work table rotatable with the work table sucking and holding a substrate; a cup wheel-type first grinding wheel configured to grind the rotating substrate while rotating, the substrate being held by the work table; and a cup wheel-type second grinding wheel configured to grind the substrate along with grinding by the first grinding wheel while rotating in a close vicinity of the substrate.


