Dual-Density Porous Flow Restrictor for Insulated Leak-Free Gas Flow
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Solution Overview
Problem
Existing porous flow restrictors fail to effectively regulate fluid flow while maintaining electrical insulation and dielectric strength, especially under high electrical potentials, and do not provide sufficient radial hermiticity to prevent leaks.
Innovation Solution
A dual density disc comprising a dense outer tube with a high-purity metal oxide and a porous core of lower density, where the porous core has a purity greater than 99% and is integrated with threads on the inner surface of the dense outer tube, allowing for uniform gas flow and preventing contamination in semiconductor manufacturing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a porous structure is used to regulate fluid flow, then flow control capability is improved, but electrical insulation and dielectric strength deteriorate under high electrical potentials
Solution Approach 1:
The flow restrictor employs a dual-density structure where the outer peripheral region has high density (providing electrical insulation and dielectric strength) and the central region has low density (providing flow control capability). This local differentiation of material properties allows simultaneous achievement of flow regulation and electrical insulation without compromise.
2Productivity
If a porous structure is used to enable fluid flow, then flow capability is improved, but radial hermiticity and leak prevention deteriorate
Solution Approach 1:
The outer peripheral region of the flow restrictor is designed with high density to provide radial hermiticity and prevent leaks, while the central region maintains low density for fluid flow capability. This spatial differentiation ensures that the porous structure enables flow without compromising sealing integrity.
3Reliability
If high purity metal oxide is used to prevent contamination, then purity is improved, but manufacturing complexity increases
Solution Approach 1:
The invention achieves high purity (greater than 99.99%) in the sintered flow restrictor by controlling the particle size distribution of the metal oxide powder within a specific range (0.1 to 10 micrometers) and optimizing sintering parameters. This parameter control approach enables high purity manufacturing without requiring excessively complex processing steps.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The dual density disc effectively regulates fluid flow, maintains electrical insulation, and provides radial hermiticity, ensuring leak-proof operation and high purity in semiconductor manufacturing processes.
Implementation Method 1
The porous interior regulates the flow of fluid while maintaining sufficient electrical insulation and dielectric strength... The alumina disc or rod... permits uniform flow of a process gas or other fluid stream... preventing contamination in semiconductor manufacturing
Implementation Method 2
sintering the dense outer tube with the porous core at a temperature of 800 to 2000° C. in one or more steps
Data Source
AI summary
Disclosed herein is a dual density disc comprising a dense outer tube comprising a metal oxide having a purity of greater than 92%; and a porous core comprising a metal oxide of a lower density than a density of the dense outer tube; wherein the porous core has a metal oxide purity of greater than 99%; where the dense outer tube has an inner tapered surface.