Dual Electron Beam Column for 3D Printing Stability

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Solution Overview

Problem

Conventional three-dimensional printing devices using electron beams for metal powder processing face issues with reproducibility and processing speed due to changes in electron beam characteristics and the need for stabilization, particularly when adjusting beam current values for different irradiation conditions.

Innovation Solution

The use of a dual electron beam system with independent beam shape deformation and deflection capabilities, allowing for simultaneous and controlled melting and preliminary irradiation of powder layers with distinct electron beams, enhancing stability and reproducibility by overlapping deflection ranges and adjusting beam shapes for melting, outlining, and preliminary irradiation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If the beam current value of an electron source is changed to cope with different irradiation conditions, then the adaptability to different processing requirements is improved, but the reproducibility of electron beams deteriorates and processing speed lowers due to stabilization time requirements

Engineering Contradiction:
Improveadaptability to different irradiation conditionsVSAvoidreproducibility of electron beams
Core Design Contradiction:
Adaptability or versatilityVSReliability

Solution Approach 1:

The invention divides the electron beam system into multiple independent electron sources (first electron source and second electron source), each capable of operating at fixed beam current values. This segmentation allows the system to switch between different electron sources rather than changing parameters of a single source, thereby maintaining reproducibility while achieving adaptability to different irradiation conditions.

Inventive Principle:
Principle #1Segmentation

2Adaptability or versatility

If the beam current value of an electron source is changed to cope with different irradiation conditions, then the adaptability to different processing requirements is improved, but the processing speed lowers due to stabilization time requirements

Engineering Contradiction:
Improveadaptability to different irradiation conditionsVSAvoidprocessing speed
Core Design Contradiction:
Adaptability or versatilityVSProductivity

Solution Approach 1:

The invention prepares multiple electron sources in advance, each configured for specific irradiation conditions (e.g., one for melting irradiation, another for preliminary irradiation). When a specific processing condition is required, the corresponding pre-configured electron source is selected and activated immediately, eliminating the stabilization time that would be required if parameters were changed dynamically.

Inventive Principle:
Principle #10Preliminary action

3Adaptability or versatility

If multiple electron sources are used with different beam current values, then the capability to perform different irradiation types simultaneously is improved, but the device complexity increases

Engineering Contradiction:
Improvecapability to perform different irradiation typesVSAvoidcomplexity of electron beam column
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The invention designs the electron beam column with shared components that serve multiple functions: a common electromagnetic lens that converges beams from different electron sources, a common deflector that adjusts irradiation positions for multiple beams, and beam shape deforming elements that can shape different beams. This multi-functionality approach allows multiple electron sources to operate simultaneously while minimizing the increase in overall device complexity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach improves the stability and reproducibility of electron beam processing, allowing for faster and more precise three-dimensional printing by maintaining consistent beam conditions across different irradiation steps, reducing the need for frequent beam shape alterations and stabilization time.

Implementation Method 1

irradiating predetermined ranges on surfaces of powder layers made of metal materials or the like with electron beams, forming cross-section layers by melting and solidifying part of the powder layers

Methodology Applied
Scientific EffectElectromagnetic energy to thermal energy conversion: Electromagnetic Induction

Implementation Method 2

an electromagnetic lens that converges the first electron beam and the second electron beam

Methodology Applied
Scientific EffectElectromagnetic lens focusing: Electromagnetic Induction

Implementation Method 3

a first electron source that outputs a first electron beam accelerated to a predetermined acceleration voltage; a second electron source that outputs a second electron beam accelerated to a predetermined acceleration voltage

Methodology Applied
Scientific EffectElectron acceleration: Electric Field

Data Source

PatentUS11458561B2Electron beam column for three-dimensional printing device, three-dimensional printing device, and three-dimensional printing method
Publication Date: 2022.10.04 ADVANTEST CORP
  • US11458561B2 patent drawing
  • US11458561B2 patent drawing
  • US11458561B2 patent drawing

AI summary

To provide a three-dimensional printing device that irradiates approximately the same ranges on the surface of a powder layer simultaneously with a plurality of electron beams having different beam shapes. An electron beam column 200 of the three-dimensional printing device 100 includes a plurality of electron sources 20 including electron sources having anisotropically-shaped beam generating units, and beam shape deforming elements 30 that deform the beam shapes of electron beams output from the electron sources 20 on a surface 63 of a powder layer 62. A deflector 50 included in the electron beam column 200 deflects an electron beam output from each of the plurality of electron sources 20 by a distance larger than the beam space between electron beams before passing through the deflector 50.