Alternating Dual Electron Beam Guns for Continuous Cleaning
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Charged particle beam emitting devices, such as electron microscopes, face interruptions and reduced throughput due to the need for frequent cleaning of emitting surfaces, which disrupts the manufacturing process and reduces emission stability.
Innovation Solution
Implementing a charged particle beam emitting device with two separate guns that alternate operation, allowing one gun to be cleaned while the other is in use, synchronized with non-operational periods to maintain continuous beam availability and high emission current.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If frequent cleaning of the emitting surface is performed to maintain emission stability, then emission current stability is improved, but interruptions to the manufacturing process increase and throughput decreases
Solution Approach 1:
The patent divides the single beam system into two separate charged particle beams (first beam and second beam) with separate emitters. This segmentation allows one beam to be cleaned while the other continues to operate, eliminating the need to stop the manufacturing process for cleaning operations while maintaining emission stability through alternating use of the two beams
2Reliability
If the charged particle beam emitting device is shut down for cleaning, then emission current stability is improved, but interruptions to the manufacturing process increase
Solution Approach 1:
The patent implements continuous useful action by maintaining two separate charged particle beams in parallel, where one beam is always available for operation while the other undergoes cleaning. This ensures uninterrupted beam supply to the manufacturing process, eliminating downtime associated with cleaning operations while preserving emission current stability through the alternating beam system
3Productivity
If two separate charged particle beam guns are implemented to allow alternating cleaning and operation, then throughput is improved, but device complexity increases
Solution Approach 1:
The patent applies universality by designing the two charged particle beam guns to be substantially identical in structure and function, with each gun capable of performing both operation and cleaning roles. This multi-functionality allows the system to maintain high throughput through alternating beam use while managing device complexity through standardized, interchangeable components rather than fundamentally different systems
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach minimizes interruptions and maintains high emission current stability by frequent, short cleaning intervals, extending the lifetime of the emitters and improving throughput in high-demand applications like semiconductor inspection.
Implementation Method 1
a deflector unit adapted for alternatively directing the charged particle beams of the at least two charged particle beam guns on the at least one aperture opening so that, at the same time, one of the at least two charged particle beams is directed on the aperture opening while the respective other charged particle beam of the at least two charged particle beams is deflected from the aperture opening by the deflector unit
Data Source
AI summary
A charged particle beam emitting device includes at least two charged particle beam guns, each of the at least two charged particle beam guns having a separate charged particle emitter with an emitting surface for emitting a respective charged particle beam. The charged particle beam emitting device further includes an aperture element comprising at least one aperture opening and a deflector unit. The deflector unit is adapted for alternatively directing the charged particle beams of the at least two charged particle beam guns on the at least one aperture opening so that, at the same time, one of the at least two charged particle beams is directed on the aperture opening while the respective other charged particle beam of the at least two charged particle beams is deflected from the aperture opening by the deflector unit. At the same time, only one of the two charged particle beam guns is used so that the temporarily unused charged particle beam gun can be subjected to a cleaning procedure. This ensures that the emitting surfaces of both charged particle beam guns can be alternatively and frequently cleaned with minimum interruption of the operation of the charged particle beam device.