Dual Energy Beam EUV Light Source for Gas Density Control
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Solution Overview
Problem
Existing extreme ultraviolet light source devices face challenges in controlling the gas density of plasma raw material in the discharge zone, leading to inefficient generation of EUV radiation at 13.5 nm wavelength due to uneven evaporation and diffusion of raw materials between electrodes.
Innovation Solution
The device employs a dual energy beam irradiation system, where a first energy beam evaporates the raw material, and a second energy beam further evaporates it just before discharge initiation, controlling the gas density within 300 nanoseconds to ensure high-density plasma formation, thereby optimizing EUV radiation generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single energy beam is used to evaporate raw material, then the process is simple, but the gas density of plasma raw material in the discharge zone cannot be controlled appropriately
Solution Approach 1:
The evaporation process is divided into two distinct stages using two separate energy beams: a first energy beam for initial evaporation and a second energy beam for final evaporation just before discharge. This segmentation allows independent control of each evaporation stage, enabling precise control of the gas density of plasma raw material in the discharge zone.
Solution Approach 2:
The first energy beam performs preliminary evaporation of the raw material, creating an initial vapor cloud. Then, the second energy beam is applied at a precisely controlled timing (within 300 nanoseconds before discharge) to further evaporate and concentrate the raw material, ensuring optimal gas density is achieved just before the discharge occurs.
2Ease of operation
If raw material is evaporated and allowed to diffuse freely between electrodes, then the process is simple, but the gas density becomes uneven and inappropriate for efficient EUV generation
Solution Approach 1:
The system uses periodic, pulsed energy beam irradiation instead of continuous evaporation. The first energy beam irradiates the raw material, then after a controlled interval (within 300 nanoseconds), the second energy beam irradiates the same region. This periodic action prevents excessive diffusion and maintains uniform, appropriate gas density in the discharge zone.
Solution Approach 2:
The two energy beams are applied in rapid succession with a timing interval of within 300 nanoseconds, which is short enough to prevent significant diffusion of the evaporated material. This continuous action ensures that the gas density remains uniform and appropriate throughout the discharge zone, maximizing EUV generation efficiency.
3Productivity
If electrodes are used continuously without interruption, then productivity is maintained, but thermal loading and wear increase, reducing electrode lifetime
Solution Approach 1:
The energy beams are applied in a precisely timed sequence: the first beam evaporates raw material, then within 300 nanoseconds the second beam further evaporates it before discharge initiation. This preliminary, controlled evaporation prevents excessive material accumulation and reduces thermal shock to the electrodes during discharge, thereby extending electrode lifetime while maintaining productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for efficient EUV radiation production by maintaining suitable gas density in the discharge zone, enhancing the conversion efficiency of EUV radiation and extending electrode lifetime by reducing thermal loading and wear.
Implementation Method 1
a first energy beam is radiated towards raw material supplied onto discharge electrodes for causing the raw material to evaporate
Implementation Method 2
the raw material in the region irradiated by the first energy beam is irradiated by the second energy beam and the raw material is further evaporated
Implementation Method 3
a discharge is initiated in the gap between the pair of discharge electrodes by the evaporated raw material, and the discharge heats and excites high-temperature plasma raw material
Implementation Method 4
the EUV radiation emitted from this plasma is extracted
Data Source
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AI summary
An extreme ultraviolet light source device comprising a pair of mutually opposed discharge electrodes, pulsed power supplying means adapted to supply pulsed power to said discharge electrodes, raw material supplying means for supplying liquid or solid raw material to said electrodes in order to cause extreme ultraviolet radiation to be emitted at said discharge electrodes, and energy beam irradiation means adapted to emit an energy beam for irradiating the raw material supplied to said discharge electrodes in order to initiate a discharge in the gap between said pair of discharge electrodes by said raw material being evaporated, wherein said energy beam irradiation means is comprised of a first energy beam irradiation means adapted to emit a first energy beam for irradiating said raw material supplied to said discharge electrodes and causing said raw material to evaporate, and a second energy beam irradiation means adapted to emit a second energy beam for irradiating the raw material in the region irradiated by said first energy beam for further evaporating the raw material after irradiation of said first energy beam and in the interval before the discharge is initiated in the gap between said pair of discharge electrodes.