Dual Filament Electron Source for Mass Spectrometry
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Solution Overview
Problem
Existing mass spectrometers with dual filament ion sources face increased manufacturing costs and complexity due to the need for additional electrical and mechanical connections, and existing solutions do not adequately address the issue of filament burnout without significant disruption to operations.
Innovation Solution
A dual filament configuration where two electron emitters are positioned in an overlying relationship with reduced spacing and shared electrical potential, minimizing insulative layer buildup and allowing for seamless switching between filaments in case of burnout, with a control system to manage filament operation and maintain continuous operation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If two separate filaments are provided with one filament on each side of the ion volume, then filament redundancy is achieved, but manufacturing cost and device complexity increase
Solution Approach 1:
Two separate filaments are merged into a single support structure positioned on one side of the ion volume. The filaments are arranged in an overlying relationship where they share common electrical connections and mechanical support, eliminating the need for separate connections on both sides of the ion volume while maintaining redundancy
Solution Approach 2:
The common support structure serves multiple functions: it provides mechanical support for both filaments, establishes shared electrical connections for both filaments, and enables selective activation of either filament. This multi-functional design reduces overall device complexity while maintaining filament redundancy
2Device complexity
If two separate filaments are supported on common structure with transverse spacing, then manufacturing complexity is reduced, but insulative layer buildup occurs on inactive filaments
Solution Approach 1:
The filaments are arranged in an overlying relationship where one filament is positioned directly above the other along the electron travel path, rather than spacing them transverse to the electron beam. This vertical stacking in the electron travel dimension allows the inactive filament to be heated by the active filament without significant transverse displacement, reducing insulative layer buildup
3Reliability
If filaments are spaced apart to prevent contact on burnout, then filament safety is improved, but operational disruption increases
Solution Approach 1:
The filament support structure allows for dynamic response to filament failure. When one filament burns out, the control system can rapidly switch to the other filament without requiring physical repositioning or significant operational changes. The overlying configuration enables quick failover while maintaining stable ion production characteristics
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration reduces the buildup of insulative layers on inactive filaments, minimizes operational disruption during filament failure, and maintains the stability and quality of ion production, allowing for continuous operation with minimal downtime.
Implementation Method 1
The electron source includes a filament that is energized to emit electrons for the stream
Data Source
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AI summary
An electron source can selectively provide a first stream of electrons that travels in a direction along an imaginary line to a location remote from the electron source, or a second stream of electrons that travels in the direction along the line to the location. The electron source includes a first electron emitter for selectively emitting electrons for the first stream, and a second electron emitter for selectively emitting electrons for the second stream. A different aspect relates to a method for operating an apparatus having an electron source that includes first and second electron emitters. The method includes selectively producing a first stream of electrons that travels from the first electron emitter in a direction along an imaginary line to a location remote from the electron source, or a second stream of electrons that travels from the second electron emitter in the direction along the line to the location.