Dual Gas Feed Showerhead for Dynamic Radius Tuning
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Solution Overview
Problem
Conventional showerheads in semiconductor wafer processing equipment have fixed plenum radii, requiring showerhead swapping to change the application radius of gases, which is time-consuming and labor-intensive.
Innovation Solution
A showerhead design with an inner plenum and edge plenum connected internally, allowing dynamic adjustment of gas flow rates to modulate the effective radius of gas application, enabling radial tuning of gas concentrations and dose delivery to different substrate areas.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If showerhead swapping is used to change the application radius of gases, then the effective radius can be changed, but operational time and labor are increased
Solution Approach 1:
The patent applies the dynamics principle by making the plenum radius adjustable rather than fixed. The showerhead includes a plenum with adjustable geometry that allows the application radius of gases to be dynamically changed during operation through mechanical adjustment mechanisms, eliminating the need to swap entire showerhead assemblies to change the effective radius.
Solution Approach 2:
The patent segments the showerhead into modular components, specifically separating the plenum (gas distribution chamber) from the fixed showerhead body. This segmentation allows the plenum to be independently adjusted or replaced without swapping the entire showerhead, reducing operational time while maintaining adaptability of the application radius.
2Adaptability or versatility
If showerhead swapping is used to change the application radius of gases, then the effective radius can be changed, but labor intensity is increased
Solution Approach 1:
The dynamics principle is applied by enabling continuous adjustment of the plenum radius through a control mechanism, allowing operators to change the application radius without manual showerhead swapping. This reduces labor intensity while maintaining the ability to adapt the effective radius to different process requirements.
Solution Approach 2:
The patent incorporates automated control mechanisms that allow the plenum radius to be adjusted through control signals rather than manual intervention. The system can self-adjust the application radius based on process parameters, significantly reducing labor intensity while maintaining adaptability.
3Ease of manufacture
If fixed plenum radius is used in showerhead design, then manufacturing is simplified, but flexibility in modulating gas application is reduced
Solution Approach 1:
The patent segments the showerhead design into a fixed body and an adjustable plenum component. The fixed body maintains simple manufacturing, while the plenum is designed as a separate module with adjustable geometry. This segmentation allows the plenum to be manufactured with adjustment mechanisms while the main body remains simple to manufacture.
Solution Approach 2:
The patent creates a universal showerhead design where a single showerhead body can accommodate multiple plenum configurations with different radii. The adjustable plenum mechanism allows one showerhead to perform multiple functions (different application radii) without requiring separate showerheads for each radius, balancing manufacturing simplicity with operational flexibility.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design allows for precise control of film thickness on different substrate areas without the need to swap showerheads, reducing operational time and effort by dynamically adjusting the application radius of gases.
Implementation Method 1
a first inlet for receiving a first gas from a first source into an inner plenum... a second inlet for receiving a second gas from a second source through an edge plenum into the inner plenum... deliver the first gas and the second gas from the inner plenum to the substrate
Data Source
AI summary
A showerhead utilized within a process chamber includes a first inlet for receiving a first gas from a first source at a center region of an inner plenum defined therein. A plurality of second inlets is defined along a peripheral region of the showerhead for receiving a second gas from a second source. A plurality of conduits couples the edge plenum to an outer edge of the inner plenum so as to supply the second gas to the inner plenum. The first gas creates an inner flow that flows radially outward from the center region to an outer edge of the inner plenum and the second gas supplied by the edge plenum creates a perimeter flow that flows inward from the outer edge of the inner plenum toward the center region. A stagnation point defining an adjustable radius is formed at an interface of the first gas and the second gas. A plurality of outlets are defined across a lower surface of the showerhead and extends a diameter of the inner plenum such that the first gas from the inner flow exits the plurality of outlets from the center region up to the stagnation point and the second gas from the perimeter flow exits the plurality of outlets from the stagnation point to the outer edge.