Dual Ion Source Analyzing Magnet for Low-Downtime Implantation

Resolve Bottlenecks,
Find Innovative SolutionsGenerate Solutions

Solution Overview

Problem

Conventional ion implantation systems face productivity issues due to ion source life problems, such as erosion and x-ray radiation concerns, which require shutdowns for maintenance and species changes, leading to downtime and reduced productivity.

Innovation Solution

An ion implantation system with a mass analyzing magnet configured to accept ions from multiple sources, using shields to prevent x-ray transmission and allow simultaneous operation and maintenance, enabling individual access and maintenance of ion sources without shutting down the system.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If multiple ion sources are implemented for changing ion species or maintenance, then ion species versatility is improved, but system shutdown time increases due to safety requirements

Engineering Contradiction:

Improveion species change capabilityVSAvoidsystem shutdown time

Core Design Contradiction:

Adaptability or versatilityVSLoss of time

Solution Approach 1:

The system is divided into separate operational zones: an active ion source region and a maintenance region. The analyzing magnet configuration allows one ion source to operate while another is maintained, segmenting the maintenance process from continuous operation. This enables parallel operation and maintenance of different ion sources without requiring full system shutdown.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The analyzing magnet acts as an intermediary element that receives ion beams from multiple sources. By configuring the magnet with specific pole arrangements and beam paths, it enables selective operation of different ion sources while maintaining system continuity. The magnet geometry allows one source to be active while another is accessed for maintenance.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Productivity

If ion sources are accessed for maintenance during operation, then productivity is improved, but x-ray radiation safety risks increase

Engineering Contradiction:

Improvecontinuous operation capabilityVSAvoidx-ray radiation exposure

Core Design Contradiction:

ProductivityVSObject-affected harmful factors

Solution Approach 1:

The system segments ion sources into separate accessible positions (e.g., first and second ion sources at different locations). When one ion source requires maintenance, the system can switch to another ion source while maintaining production. This spatial segmentation allows maintenance access without exposing personnel to x-ray radiation from active sources.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The dual ion source configuration with the analyzing magnet enables continuous ion beam production. While one ion source is maintained, the other continues to produce ions for implantation. This continuity eliminates downtime and maintains productivity while managing radiation safety through source isolation.

Inventive Principle:

Principle #20Continuity of useful action

3Device complexity

If conventional single ion source configuration is used, then system simplicity is maintained, but ion source lifetime and productivity are reduced due to shutdown requirements

Engineering Contradiction:

Improvesystem configurationVSAvoidion source availability

Core Design Contradiction:

Device complexityVSProductivity

Solution Approach 1:

The analyzing magnet is configured to handle ion beams from multiple ion sources universally. The same magnet structure and beamline components serve both ion sources, allowing the system to switch between sources without requiring duplicate beamlines. This multi-functionality maintains relative system simplicity while enabling continuous operation through source redundancy.

Inventive Principle:

Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration allows for continuous operation with minimal downtime, extended ion source lifetimes, and reduced maintenance complexities, enhancing productivity by enabling safe and concurrent maintenance of ion sources.

Implementation Method 1

a mass analyzing magnet configured to accept ions from multiple sources

Methodology Applied

Scientific EffectMagnetic field: Magnetic Field

Implementation Method 2

mass analyze the first ion beam and second ion beam, respectively

Methodology Applied

Scientific EffectLorentz force: Lorentz Force

Implementation Method 3

using shields to prevent x-ray transmission

Methodology Applied

Scientific EffectX-ray radiation: X-Ray

Data Source

PatentUS11823858B2Dual source injector with switchable analyzing magnet

Publication Date: 2023.11.21 AXCELIS TECHNOLOGIES INC

AI summary

An ion implantation system has a mass analyzing magnet having interior and exterior region and defining a first entrance, second entrance, and an exit. A first ion source defines a first ion beam directed toward the first entrance along a first beam path. A second ion source defines a second ion beam directed toward the second entrance along a second beam path. A magnet current source supplies a magnet current to the mass analyzing magnet. Magnet control circuitry controls a polarity of the magnet current based on a formation of the first or second ion beam. The mass analyzing magnet mass analyzes the respective first or second ion beam to define defining a mass analyzed ion beam along a mass analyzed beam path. At least one shield in the interior or exterior region prevents line-of-sight between the first and second ion sources. Beamline components modify the mass analyzed ion beam.