Dual-Ligand Nanoparticles for High-Resolution QLED Patterning

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Current QLED production efficiency has not reached mass production levels due to the lack of breakthroughs in high-resolution patterning technologies, particularly for patterned quantum dot nanoparticles, where methods like vapor deposition and inkjet printing face limitations, and photolithography can affect nanoparticle performance.

Innovation Solution

A nanoparticle with a core/shell-structured inorganic nanograin surface ligands, where a first ligand is alkali-soluble and a second ligand undergoes crosslinking when heated, enabling a photolithography-based patterning process for display substrates, including spin coating and blade coating techniques.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If photolithography is used to produce patterned nanoparticles, then manufacturing precision is improved, but nanoparticle performance deteriorates due to exposure process effects

Engineering Contradiction:
Improvepatterning resolutionVSAvoidnanoparticle performance
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The patent changes the chemical parameters of the nanoparticle surface by introducing dual ligands with different functionalities. The first ligand provides alkali solubility for photolithography compatibility, while the second ligand undergoes crosslinking to protect nanoparticle performance, resolving the contradiction between patterning precision and nanoparticle integrity

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The nanoparticle is designed as a composite structure with two types of ligands on its surface. This composite ligand system enables the nanoparticle to simultaneously exhibit alkali solubility for high-resolution patterning and crosslinking capability for performance protection, eliminating the need for harmful exposure processes

Inventive Principle:
Principle #40Composite materials

2Device complexity

If inkjet printing is used to produce patterned nanoparticles, then device complexity is reduced, but manufacturing precision deteriorates

Engineering Contradiction:
Improvepatterning process complexityVSAvoidpatterning resolution
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The patent replaces the mechanical inkjet printing process with a chemical-based photolithography approach using dual ligand-functionalized nanoparticles. The alkali-soluble first ligand enables the nanoparticles to be patterned through chemical etching rather than mechanical deposition, achieving high resolution without complex printing equipment

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Manufacturing precision

If vapor deposition is used to produce patterned nanoparticles, then manufacturing precision is improved, but ease of manufacture deteriorates

Engineering Contradiction:
Improvepatterning resolutionVSAvoidproduction efficiency
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent changes the physical and chemical parameters of the nanoparticle by equipping it with dual ligands. The first ligand's alkali solubility enables simple wet-chemical patterning processes that achieve vapor-deposition-level precision without requiring complex vacuum deposition equipment, significantly improving ease of manufacture

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The dual ligand system creates local chemical differences on the nanoparticle surface: the first ligand region provides alkali solubility for precise patterning while the second ligand region provides crosslinking protection. This local functional differentiation enables high-precision manufacturing through simple chemical processes

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach allows for higher resolution and improved process yield, making it suitable for large-scale production of patterned quantum-dot layers for display devices, enhancing the stability and luminous efficiency of quantum light-emitting diodes.

Implementation Method 1

the second ligand undergoes a crosslinking reaction when heated

Methodology Applied
Scientific EffectCrosslinking reaction: Chemical Bonding

Implementation Method 2

exposing the photoresist with a mask, to form a photoresist removal region and a photoresist reserved region

Methodology Applied
Scientific EffectPhotopolymerization: Photopolymerisation

Implementation Method 3

Quantum dots can emit fluorescence after being excitated because electrons and holes are quantum confined, a continuous band structure becomes a discrete energy level structure

Methodology Applied
Scientific EffectQuantum confinement:

Data Source

PatentUS11258026B2Nanoparticle, method for preparing display substrate and display device
Publication Date: 2022.02.22 BEIJING BOE TECH DEV CO LTD
  • US11258026B2 patent drawing
  • US11258026B2 patent drawing
  • US11258026B2 patent drawing

AI summary

The nanoparticle of the embodiments of the present disclosure includes nanograins, and a first ligand and a second ligand connected to a surface of each nanograin, wherein the first ligand has alkali solubility, and the second ligand undergoes a crosslinking reaction when heated. The method for preparing the display substrate according to embodiments of the present disclosure includes: forming a nanoparticle layer on a substrate; coating a photoresist on the nanoparticle layer, exposing the photoresist with a mask; developing to remove the photoresist in the photoresist removal region, such that the exposed nanoparticle layer is dissolved into a developing solution; performing post-baking treatment, such that a second ligand of the nanoparticle covered by the photoresist in the photoresist reserved region undergoes a crosslinking reaction, and the nanoparticle layer covered by the photoresist in the photoresist reserved region is fixed on the substrate; and stripping the photoresist, to complete a patterning of the nanoparticle layer.