Dual Load Lock Chamber Throughput Optimization
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Solution Overview
Problem
Conventional load lock chambers in multi-chamber processing systems act as bottlenecks, reducing throughput due to the need for multiple trips by a transfer robot between the load lock chamber and multi-chamber systems.
Innovation Solution
A dual load lock chamber configuration with two adjacent load lock chambers, each with vertically spaced support surfaces and heat transfer devices, allowing a vacuum robot to transfer multiple substrates in a single trip by optimizing the spacing between support surfaces and blades, thereby reducing the number of trips required.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a conventional single load lock chamber is used, then the structure is simple, but the throughput is reduced due to multiple trips required by the transfer robot
Solution Approach 1:
The load lock chamber is segmented into multiple independent chambers (first load lock chamber and second load lock chamber), each capable of holding and processing substrates independently. This segmentation allows the transfer robot to move multiple substrates simultaneously across different chambers, increasing throughput without requiring multiple sequential trips between single chambers.
Solution Approach 2:
The patent introduces a vertical dimension to substrate storage by implementing multiple vertically spaced support surfaces within each load lock chamber. This multi-level arrangement allows substrates to be stacked vertically, enabling the robot to transfer multiple substrates in a single trip by accessing different vertical levels, thereby improving productivity without proportionally increasing horizontal space or trip count.
2Productivity
If multiple substrates are stored in a single load lock chamber, then throughput improves, but substrate processing uniformity deteriorates due to varying distances from heat transfer devices
Solution Approach 1:
Each load lock chamber is equipped with dedicated heat transfer devices positioned to serve specific substrates locally. The first load lock chamber has heat transfer devices optimized for its substrates, and the second load lock chamber has separate heat transfer devices for its substrates. This local quality approach ensures that each substrate receives appropriate thermal treatment regardless of its position, maintaining processing uniformity while enabling multiple substrates to be processed simultaneously across different chambers.
Solution Approach 2:
The patent segments the substrate processing function by distributing substrates across multiple independent load lock chambers, each with its own heat transfer devices. This segmentation ensures that substrates in different chambers can be processed independently and uniformly, avoiding the uniformity issues that would arise from trying to heat multiple substrates at different distances within a single chamber.
3Quantity of substance
If vertically spaced support surfaces are used, then multiple substrates can be held, but the spacing must be optimized to accommodate robot blades while ensuring proper heat transfer
Solution Approach 1:
The patent optimizes the vertical spacing parameter between support surfaces to balance multiple requirements: the spacing must be large enough to accommodate robot blade insertion and substrate removal, small enough to maintain efficient heat transfer from heat transfer devices to substrates, and configured to allow proper airflow. This parameter optimization enables maximum substrate capacity while maintaining operational simplicity and processing effectiveness.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances the throughput of multi-chamber processing systems by enabling simultaneous loading and unloading of substrates, reducing the number of trips needed and improving processing efficiency.
Implementation Method 1
at least one heat transfer device disposed within the first substrate support to heat or cool the first plurality of substrates
Data Source
AI summary
Dual load lock chambers for use in a multi-chamber processing system are disclosed herein. In some embodiments, a dual load lock chamber, includes a first load lock chamber having a first interior volume and a first substrate support, wherein the first substrate support includes a first plurality of support surfaces vertically spaced apart by a first predetermined distance; at least one heat transfer device disposed within the first substrate support to heat or cool the first plurality of substrates; and a second load lock chamber disposed adjacent to the first load lock chamber and having a second interior volume and a second substrate support, wherein the second substrate support includes a second plurality of support surfaces vertically spaced apart by a second predetermined distance that less than the first predetermined distance.


