Dual Low-Voltage Electron Beam Microscopy for Radiation-Sensitive Samples
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Solution Overview
Problem
Transmission electron microscopy of organic materials, particularly biological materials, is challenging due to radiation damage caused by high-energy electrons, which existing methods fail to effectively mitigate.
Innovation Solution
A dual low-voltage electron beam system is employed, where a first electron beam is directed at the sample's surface to interact and scatter, while a second low-voltage electron beam passes through the sample to gather internal characteristics without causing damage, using a configuration that includes a first electron source, magnetic deflection units, and optics to manage the electron beams' energy levels and paths.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If high-energy electrons are used for transmission electron microscopy, then imaging capability is improved, but radiation damage to the sample increases
Solution Approach 1:
The patent changes the energy parameter of the electron beam from high-energy to low-voltage (below 100 eV), transforming the beam characteristics to reduce radiation damage while maintaining imaging capability through surface interaction rather than transmission
Solution Approach 2:
The patent separates the imaging function into two distinct electron beam paths: a first low-voltage electron beam for surface imaging and a second low-voltage electron beam for transmission imaging, allowing each beam to be optimized for its specific function without compromising the sample
2Object-affected harmful factors
If low-voltage electron beams are used, then radiation damage is reduced, but imaging resolution deteriorates
Solution Approach 1:
The patent divides the imaging task into two separate low-voltage electron beam systems, each optimized for specific imaging modes (surface and transmission), thereby maintaining high resolution while using low voltages that prevent radiation damage
Solution Approach 2:
The patent creates a dual-purpose electron microscopy system where two low-voltage electron beam sources can perform different imaging functions (surface and transmission) simultaneously, making the low-voltage system universally capable of multiple imaging modes without requiring high energy
3Device complexity
If a single electron beam is used, then device complexity is reduced, but imaging versatility is limited
Solution Approach 1:
The patent segments the electron beam system into two independent low-voltage beam sources with separate optical paths, enabling simultaneous surface and transmission imaging capabilities while keeping each beam path relatively simple and manageable
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for high-resolution imaging of the sample's surface and internal structures without causing radiation damage, enabling detailed analysis with minimal sample alteration.
Implementation Method 1
a first electron beam source configured to generate a first electron beam to travel in a first direction to contact a surface region of the sample and to scatter from the surface region of the sample and travel in a second direction opposite the first direction
Implementation Method 2
using a configuration that includes a first electron source, magnetic deflection units, and optics to manage the electron beams' energy levels and paths
Data Source
AI summary
Embodiments of the invention relate to electron microscopy. Example embodiments relate to an apparatus including a first electron beam source, a second electron beam source, and a receiving unit. The first electron beam source is configured to provide a first low-voltage electron beam to a surface of a sample. The second electron beam source is configured to provide a second low-voltage electron beam to pass through the sample. The receiving unit is configured to analyze the first low-voltage electron beam, or the second low-voltage electron beam, or both the first and the second electron beam to obtain information about the sample.