Dual Medium Filter for Semiconductor Fluid Purification
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Semiconductor fabrication processes face challenges in reducing particle and metal ion contamination, which affects yield and reliability, as standard filters have low throughput capacity, are expensive, and require frequent maintenance.
Innovation Solution
Incorporating a dual-medium filtering system that includes an ion exchange filter and a particle filter, configured in series or combined in a dual-medium filter, to remove ions and particles from fluids in real-time as they are provided to semiconductor processing tools, ensuring continuous filtration without storage and minimizing re-contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If standard reverse osmosis filters are used to filter fluid, then particle contamination is reduced, but flow through capacity is low and maintenance frequency increases
Solution Approach 1:
The patent combines an ion exchange filter and a particle filter into a single dual-medium filter unit. The ion exchange medium removes metal ions while the particle filter removes particulate matter, both functions integrated in one device that maintains high flow through capacity suitable for semiconductor processing tools.
Solution Approach 2:
The filter employs composite filtering media including ion exchange resin and particle filter medium within a single housing structure. This composite approach allows simultaneous removal of ions and particles while maintaining the flow rates required for high throughput semiconductor fabrication.
2Reliability
If standard reverse osmosis filters are used to filter fluid, then particle contamination is reduced, but maintenance frequency increases
Solution Approach 1:
By merging ion exchange and particle filtering functions into one unit, the patent reduces the number of separate filter components that require maintenance. The integrated design allows for easier maintenance and reduced downtime compared to managing multiple separate filtration systems.
3Reliability
If filters are used to remove particles from fluid, then wafer contamination is reduced, but filter cost increases
Solution Approach 1:
The dual-medium filter integrates multiple filtration functions (ion exchange and particle removal) into a single unit, reducing the total number of filter components required. This integration lowers overall system cost while maintaining effective contamination removal for wafer processing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly improves wafer processing yield and reliability by effectively filtering metal ions and particles in situ, reducing the risk of time-dependent dielectric breakdown and maintaining high throughput with low maintenance requirements.
Implementation Method 1
a first chamber (40) having an ion exchange medium (35) configured to filter metal ions from fluid
Implementation Method 2
a second chamber (42) having a particle filter medium (37) configured to filter particles from fluid
Data Source
AI summary
The present disclosure is directed to fluid filtering systems and methods for use during semiconductor processing. One or more embodiments are directed to fluid filtering systems and methods for filtering ions and particles from a fluid as the fluid is being provided to a semiconductor wafer processing tool, such as to a semiconductor wafer cleaning tool.