Dual Mode Power Supply for Plasma Processing Apparatus
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Solution Overview
Problem
Conventional plasma processing systems require separate power connectors and wiring for maintenance and operating modes, increasing physical complexity and exposing technicians to hazardous high voltages due to insulation failures.
Innovation Solution
A dual mode power device with a control circuit that switches between high and low voltage power supplies using a single connector, enabling safe low voltage operation for maintenance mode and high voltage operation for processing, while preventing high voltage from reaching low voltage subsystems during maintenance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If separate power connectors and wiring are used for maintenance and operating modes, then reliability is improved by preventing voltage conflicts, but device complexity increases due to additional wiring
Solution Approach 1:
The patent combines separate maintenance mode power supply and operating mode power supply into a single unified power supply system. The control circuit automatically switches between maintenance voltage and operating voltage based on detected conditions, eliminating the need for separate power connectors and wiring while maintaining reliability through automated voltage management.
Solution Approach 2:
The single power supply system is designed to perform multiple functions: it can provide maintenance voltage for testing and calibration, and switch to operating voltage for normal plasma processing. The control circuit enables this universal power supply to adapt to different operational requirements without requiring separate dedicated power paths.
2Productivity
If high voltage power supply is always connected to subsystems, then operating mode performance is maintained, but safety deteriorates during maintenance mode due to electrical hazards
Solution Approach 1:
The power supply system dynamically adjusts its output voltage based on the operational mode. During maintenance mode, the control circuit detects the maintenance condition and automatically provides low maintenance voltage to subsystems, eliminating electrical hazards. During operating mode, it switches to high operating voltage to maintain processing performance. This dynamic adaptation resolves the safety-performance contradiction.
Solution Approach 2:
The control circuit acts as an intermediary between the power supply and the voltage-consuming subsystems. It monitors system conditions and intelligently selects whether to provide maintenance voltage or operating voltage, thereby protecting technicians from high voltage during maintenance while ensuring full performance during processing operations.
3Device complexity
If a single power supply connector is used for both modes, then device complexity is reduced, but reliability worsens due to potential voltage conflicts
Solution Approach 1:
The control circuit incorporates feedback mechanisms to detect whether the system is in maintenance mode or operating mode. Based on this feedback, it automatically adjusts the power supply output to the appropriate voltage level, preventing voltage conflicts. This closed-loop control ensures that even with a single connector, the system maintains reliability by adapting to different operational requirements.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Simplifies the plasma processing apparatus by reducing wiring complexity and ensures safe maintenance operations by converting high voltage to low voltage for subsystem testing, reducing the risk of electrical hazards to technicians.
Implementation Method 1
the DC to DC converter is coupled to the fuse and converts the first voltage to the second voltage
Implementation Method 2
The fuse is provided as passive fault current protection
Implementation Method 3
The inrush protection circuit limits a current from the primary and secondary surge prevention circuit
Data Source
AI summary
A dual mode power device for controlling voltage level to a plasma processing apparatus is disclosed. The dual mode power device comprises a power supply connector and a control circuit. The power supply connector is connected to a first voltage power supply or a second voltage power supply. The control circuit is connected between an output of the power supply connector and a first and second voltage subsystem of the plasma processing apparatus. The control circuit provides a first voltage based on the first voltage power supply to the first voltage subsystem in a first mode of operation of the plasma processing apparatus. The control circuit provides a second voltage based on the second voltage power supply to the second voltage subsystem in a second mode of operation of the plasma processing apparatus.