Dual Phase Cleaning Chamber for Silicon Electrode Rupture Mitigation
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing cleaning technologies for silicon-based electrodes in plasma processing systems are inadequate in effectively cleaning the gas passages, leading to potential electrode damage and reduced performance due to inadequate fluid dynamics and pressure management.
Innovation Solution
A dual phase cleaning chamber comprising a turbulent mixing chamber, a fluid diffuser with isostatic properties, and a rupture mitigating nozzle, which uses pressurized cleaning fluids with alternating phases to isostatically impinge the electrode, reducing tensile stress and promoting efficient cleaning of gas passages.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If high pressure cleaning fluid is used to clean gas passages, then cleaning effectiveness is improved, but risk of electrode rupture increases
Solution Approach 1:
The patent introduces a compliance chamber between the cleaning fluid source and the electrode, which acts as a cushion to absorb pressure shocks and prevent rupture. This cushioning element is specifically designed to mitigate the harmful effects of high pressure before it reaches the electrode, allowing effective cleaning while protecting against damage.
Solution Approach 2:
The patent employs a dual-phase cleaning system that alternates between high-pressure phases (for effective cleaning) and low-pressure phases (for safety). By dynamically changing the pressure parameter over time rather than maintaining constant high pressure, the system achieves both cleaning effectiveness and electrode protection.
2Productivity
If turbulent flow is used to clean gas passages, then cleaning efficiency is improved, but fluid pressure control becomes more difficult
Solution Approach 1:
The compliance chamber serves as an intermediary element between the turbulent flow source and the electrode. It mediates the turbulent flow by dampening pressure fluctuations and smoothing out the delivery of cleaning fluid, thereby maintaining cleaning efficiency while simplifying pressure control requirements.
3Reliability
If continuous high pressure fluid delivery is used, then cleaning thoroughness is improved, but electrode distortion increases
Solution Approach 1:
The patent implements periodic action by alternating between high-pressure cleaning phases and low-pressure recovery phases. This periodic delivery pattern allows thorough cleaning to occur during high-pressure intervals while providing relief intervals that prevent cumulative distortion and damage to the electrode structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The dual phase cleaning chamber effectively cleans silicon-based electrodes by turbulently diffusing and isostatically impinging pressurized fluids through gas passages, reducing electrode distortion and enhancing cleaning efficiency while managing pressure effectively.
Implementation Method 1
a turbulent mixing chamber, in fluid communication with a first fluid inlet for providing a first phase and a second fluid inlet for providing a second phase
Implementation Method 2
a fluid diffuser including a turbulent facing surface, an isostatic facing surface and a plurality of diffusing flow-paths between the turbulent facing surface and the isostatic facing surface
Implementation Method 3
an isostatic pressure chamber. The fluid diffuser may be in fluid communication with the turbulent mixing chamber such that the turbulent facing surface of the fluid diffuser is facing the turbulent mixing chamber
Implementation Method 4
a rupture mitigating nozzle including a first fluid collecting offset, a second fluid collecting offset, and a displacement damping projection
Data Source
AI summary
In one embodiment, a dual phase cleaning chamber may include a turbulent mixing chamber, a fluid diffuser, an isostatic pressure chamber and a rupture mitigating nozzle. The turbulent mixing chamber may be in fluid communication with a first fluid inlet and a second fluid inlet. The fluid diffuser may be in fluid communication with the turbulent mixing chamber. The rupture mitigating nozzle may include a first fluid collecting offset, a second fluid collecting offset, and a displacement damping projection. The displacement damping projection may be disposed between the first and second fluid collecting offset and may be offset away from each of the first fluid collecting offset and the second fluid collecting offset, and towards the fluid diffuser. A pressurized cleaning fluid introduced from the first fluid inlet, the second fluid inlet, or both flows through the outlet passage of the first and second fluid collecting offset.