Dual Pulse Generator Architecture for Cost-Effective Plasma Triggering
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Solution Overview
Problem
Conventional high current pulse generators for applications like ablative plasma guns are economically unfeasible due to the high cost of high energy high voltage capacitors, making them impractical for most applications beyond laboratory equipment.
Innovation Solution
A dual power source pulse generator system that includes a high voltage low current pulse source and a low voltage high current pulse source, connected in parallel to generate high-density plasma between electrodes, reducing the need for expensive capacitors and enabling cost-effective operation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If high energy high voltage capacitors are used to generate high current pulses, then the required high current (greater than 5,000 Amps) and high voltage (greater than 5,000 Volts) are achieved, but the system becomes economically unfeasible due to very high cost
Solution Approach 1:
The patent divides the single high-power capacitor system into two separate pulse sources: a high voltage pulse source (greater than 5,000 Volts) and a high current pulse source (greater than 5,000 Amps). This segmentation allows each component to be optimized for its specific function, using smaller, less expensive capacitors rather than one large expensive high-energy capacitor, thereby reducing overall system cost while maintaining the required power output capability
2Power
If high energy high voltage capacitors are used to generate high current pulses, then the required high current and high voltage are achieved, but the system becomes economically unfeasible making it suitable only for laboratory equipment
Solution Approach 1:
By segmenting the power generation into separate high voltage and high current pulse sources, the system becomes more adaptable to various applications. The modular architecture allows the system to be configured for different applications such as arc flash mitigation devices, rail guns, plasma generators, and lighting ballasts, expanding versatility beyond just laboratory equipment
Solution Approach 2:
The dual pulse source system is designed with universal applicability across multiple fields. The high voltage pulse source can initiate breakdown in various media (air, gas, plasma), while the high current pulse source can deliver energy to different loads (electrodes, plasma channels, magnetic fields), making the system versatile for arc flash mitigation, rail guns, plasma generation, and lighting applications
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The dual power source system effectively generates high-density plasma at a lower cost, allowing for compact and efficient high current pulse generation suitable for various applications, including ablative plasma guns, rail guns, and arc flash mitigation devices.
Implementation Method 1
a first pulse source producing a high voltage low current pulse across the pair of electrodes to allow dielectric breakdown
Implementation Method 2
a second pulse source electrically connected in parallel with an output of the first pulse source and the pair of electrodes, and producing a low voltage high current pulse to thereby produce a current flow of high-density plasma between the same electrodes
Implementation Method 3
An arc is generated across the air gap to create conductive plasma vapors emitted out of the opening of the barrel
Data Source
AI summary
A dual power source pulse generator in power connection with a pair of electrodes having a first electrode, a second electrode and an air gap therebetween. The dual power source pulse generator includes a first pulse source producing a high voltage low current pulse across the pair of electrodes to allow dielectric breakdown, and a second pulse source electrically connected in parallel with an output of the first pulse source, and producing a low voltage high current pulse to thereby produce a current flow of high-density plasma between the same electrodes of the pair of electrodes in response to the high voltage low current pulse.