Dual Section Module Shared Unshared Mass Flow Controllers
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional dual section modules with mass flow controllers face space and cost inefficiencies when used for simultaneous dual wafer processing, and sharing controllers between sections complicates individual control adjustments due to potential differences between sections.
Innovation Solution
A dual section module design with shared and unshared mass flow controllers, where shared controllers are used in gas lines branching into two lines connected to both sections symmetrically, and unshared controllers are used in dedicated lines for each section, allowing for precise control and space optimization.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If mass flow controllers are provided per reaction section for individual control, then control precision is improved, but device cost and space requirements increase
Solution Approach 1:
The patent segments the control system into two distinct groups: shared MFCs for gases that do not constitute the main skeleton of the film (e.g., inert gases, oxidizing gases) and unshared MFCs for gases that constitute the main skeleton (e.g., precursor gases). This segmentation allows cost reduction through sharing while maintaining precision where needed.
Solution Approach 2:
Different control strategies are applied to different gas types based on their importance to film quality. Gases critical to film composition (main skeleton gases) receive dedicated MFC control in each reactor, while less critical gases (inert, oxidizing) use shared MFC control. This local differentiation optimizes both cost and precision.
2Device complexity
If mass flow controllers are shared between dual sections to reduce cost and space, then device complexity is reduced, but individual control capability deteriorates
Solution Approach 1:
The control system is segmented by gas type rather than by reactor. Shared MFCs handle inert and oxidizing gases for both reactors, while unshared MFCs handle precursor gases independently for each reactor. This enables individual control where needed while achieving cost savings through sharing.
Solution Approach 2:
Shared MFCs serve multiple functions by controlling inert and oxidizing gases for both reactors simultaneously. This multi-functionality reduces the total number of MFCs needed while maintaining adequate control capability for gases that do not require individual reactor optimization.
3Device complexity
If all mass flow controllers are shared to maximize cost effectiveness, then device cost is reduced, but control precision for film-forming gases deteriorates
Solution Approach 1:
The patent applies different control precision levels to different gas types based on their impact on film quality. Precursor gases (main skeleton) that directly affect film composition and properties receive dedicated MFC control in each reactor for high precision. Inert and oxidizing gases use shared MFC control with lower precision requirements, optimizing overall film deposition precision while reducing cost.
Solution Approach 2:
The control precision parameter is changed based on gas type. For precursor gases, high precision control is maintained through dedicated MFCs. For inert and oxidizing gases, lower precision shared MFC control is sufficient. This parameter differentiation ensures film deposition precision where critical while reducing overall system complexity.
Data Source
AI summary
A dual section module with mass flow controllers, for processing wafers, includes: dual process sections integrated together; at least one mass flow controller (MFC) each shared by the dual process sections and provided in a gas line branching into two gas lines, at a branching point, connected to the respective interiors of the dual process sections and arranged symmetrically between the dual process sections; and at least one mass flow controller (MFC) each unshared by the dual process sections and provided in a gas line connected to the interior of each dual process section.