Dual-Sided Substrate Carrier for CVD Nanotube Deposition
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Solution Overview
Problem
Existing substrate carriers for CVD reactors lack efficient designs for supporting and handling flexible substrates during carbon nanotube deposition, particularly in terms of secure attachment and easy handling within the reactor environment.
Innovation Solution
A substrate carrier with two broad side surfaces forming substrate receiving zones, featuring rounded edges for flexible substrate placement, fixing elements like screws for secure attachment, and projections with gas passage windows for handling and guiding within the reactor, allowing for efficient deposition of carbon nanotubes or graphene.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If substrates are placed freely between two opposing gas inlet elements, then the device structure is simple, but substrate positioning and handling are difficult
Solution Approach 1:
The patent introduces a substrate carrier as an intermediary component between the gas inlet elements and substrates. This carrier includes a base section with guide elements for positioning and a heating element for thermal processing, mediating the interaction between gas flow and substrate deposition while improving handling capability
Solution Approach 2:
The substrate carrier is segmented into distinct functional zones: a base section for positioning and heating, and two flat bodies for substrate support. This segmentation allows each part to perform its specific function optimally while maintaining overall system integration
2Manufacturing precision
If a substrate carrier with two flat bodies is used to support substrates, then substrate positioning is improved, but the handling and insertion into reactor becomes difficult
Solution Approach 1:
The substrate carrier is designed with symmetric flat bodies extending from a central base section, creating equipotential positioning on both sides. This symmetry ensures uniform substrate placement and balanced handling characteristics during insertion and processing
Solution Approach 2:
The base section acts as an intermediary between the two flat bodies, providing a central anchoring point with guide elements that facilitate controlled insertion into the reactor while maintaining precise substrate positioning on both flat surfaces
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables secure and efficient deposition of carbon nanotubes or graphene on substrates with improved handling and integration within the CVD reactor, ensuring uniform growth and easy maintenance.
Implementation Method 1
A heating element is located between the two flat bodies to heat them
Implementation Method 2
A chemical decomposition reaction forms nanotubes on the two diverging broad faces of the substrate support, i.e., on the substrates resting there
Implementation Method 3
This is preferably a catalytic reaction that takes place at approximately 1,000°C on the surface of the substrate
Implementation Method 4
The process gas mentioned above can flow into the process chamber through the two opposing gas outlet surfaces
Data Source
Figure 1
Figure 2~3
Figure 4~5
AI summary
The invention relates to a substrate carrier and to a CVD reactor interacting with the substrate carrier, said substrate carrier being designed to be arranged in a CVD or PVD reactor (20), in particular for the deposition of carbon nanotubes or graphene, said substrate carrier having a first broad-side surface (2) for accommodating a substrate (6) to be coated and a second broad-side surface (3) facing away from the first broad-side surface (2). In order to improve a device or parts of a device for depositing carbon nanotubes, the first broad-side surface (2) and the second broad-side surface (3) according to the invention each have a substrate accommodation zone (4, 5), in which fastening elements (14, 14', 15) are provided, by means of which a substrate (6) or sections of a substrate (6) can be fastened to the broad-side surface (2, 3). The invention further relates to a CVD reactor having a substrate carrier (1).