Dual Stage Ion Beam Scanner for Ribbon and Spot Mode Switching
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current ion implanters face challenges in operating efficiently in both ribbon beam and spot beam modes due to differences in ion trajectories, requiring extensive reconfiguration of collimators, which limits flexibility and convenience in processing substrates with varying implantation requirements.
Innovation Solution
A dual stage scanner system that generates oscillating deflecting fields in both stages, synchronized to create a common focal point upstream of the scanner, allowing the ion beam to appear as a virtual source at the mass resolving slit, enabling operation in both ribbon and spot beam modes without reconfiguring the collimator.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a single beamline is configured for ribbon beam mode, then high current implantation is achieved, but spot beam mode cannot be operated without extensive reconfiguration
Solution Approach 1:
The scanner system is designed to perform multiple functions by generating different beam patterns (ribbon and spot) through coordinated operation of first and second scanner stages. The same physical apparatus can produce both wide ribbon beams for high-current implantation and focused spot beams for precise dose control, eliminating the need for separate beamlines or extensive reconfiguration.
Solution Approach 2:
The system dynamically switches between ribbon beam and spot beam modes by adjusting the oscillation parameters of the scanner stages. The first scanner stage oscillates at a first frequency to generate ribbon beams, while the second scanner stage oscillates at a second frequency to generate spot beams. This dynamic parameter adjustment allows the same hardware to adapt to different implantation requirements without physical reconfiguration.
2Manufacturing precision
If collimator is optimized for ribbon beam, then proper collimation is achieved, but spot beam trajectories cannot be properly collimated
Solution Approach 1:
The scanner system pre-shapes the ion trajectories before they reach the collimator by using the first and second scanner stages to generate the appropriate beam pattern. For ribbon beam mode, the scanners pre-form wide diverging trajectories that match the collimator's optimization. For spot beam mode, the scanners pre-form focused trajectories that also align with the collimator's acceptance angle, allowing the same collimator to properly collimate both beam types without reconfiguration.
3Manufacturing precision
If spot beam scanning is used, then dose uniformity control is improved, but extensive reconfiguration is needed to switch from ribbon beam mode
Solution Approach 1:
The system uses dynamic parameter adjustment to switch between operating modes. The first scanner stage operates at a first oscillation frequency for ribbon beam mode, while the second scanner stage operates at a second oscillation frequency for spot beam mode. This frequency-based switching allows rapid mode changes without physical reconfiguration, preserving both dose uniformity control and operational efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables flexible operation of ion implanters in both ribbon and spot beam modes within a single setup, maintaining consistent beam geometry for the collimator, reducing the need for extensive reconfiguration and enhancing processing flexibility for substrates with different implantation needs.
Implementation Method 1
a first scanner stage to generate, responsive to a first oscillating deflection signal, a first oscillating deflecting field within the first opening
Implementation Method 2
a second scanner stage to generate, responsive to a second oscillating deflection signal, a second oscillating deflecting field within the second opening that is opposite in direction to the first oscillating deflecting field
Implementation Method 3
a scan controller to synchronize the first oscillating deflection signal and second oscillating deflection signal to generate a plurality of ion trajectories when the scanned ion beam exits the second stage that define a common focal point
Data Source
AI summary
An ion beam scanner includes a first scanner stage having a first opening to transmit an ion beam, the first scanner stage to generate, responsive to a first oscillating deflection signal, a first oscillating deflecting field within the first opening; a second scanner stage disposed downstream of the first scanner stage and having a second opening to transmit the ion beam, the second scanner stage to generate, responsive to a second oscillating deflection signal, a second oscillating deflecting field within the second opening that is opposite in direction to the first oscillating deflecting field, and a scan controller to synchronize the first oscillating deflection signal and second oscillating deflection signal to generate a plurality of ion trajectories when the scanned ion beam exits the second stage that define a common focal point.