Dual Stage Positioning System Without Cable Stage
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Solution Overview
Problem
Current dual stage positioning and switching systems in lithography machines require a cable stage to move synchronously with wafer stages, complicating the structure and reducing motion positioning accuracy due to cable interference and increased manufacturing costs.
Innovation Solution
A dual stage positioning system without a cable stage, utilizing gas levitation or magnetic levitation to connect wafer stages via X and Y-direction guide bars and motion positioning detectors, with linear motors and vacuum pipeline units for frictionless movement and temporary vacuum environments, ensuring accurate and collision-free switching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a cable stage is used to collect and move cables synchronously with the wafer stage, then all necessary cables (gas supply, control lines, sensor circuits) can be connected to the wafer stage, but the structure becomes more complex and motion positioning accuracy is reduced
Solution Approach 1:
The patent extracts and eliminates the cable stage from the dual stage positioning system. Instead of moving cables synchronously with the wafer stage, the system uses a fixed cable management approach where cables remain stationary and connections are made through flexible conduits or slip rings at the base level, thereby simplifying the overall structure while maintaining full cable connectivity.
Solution Approach 2:
The patent replaces the mechanical cable stage system with an electrical/field-based solution. By using wireless communication, optical fibers, or stationary electrical connections combined with rotary joints, the system eliminates the need for a mechanically coupled cable stage, thus reducing structural complexity while preserving all necessary connections.
2Adaptability or versatility
If a cable stage is used to collect and move cables synchronously with the wafer stage, then all necessary cables can be connected to the wafer stage, but motion positioning accuracy is reduced due to cable interference
Solution Approach 1:
The patent removes the cable stage that caused positioning accuracy degradation. By separating the cable management function from the motion stage, the wafer stage can move freely without cable drag or interference, thereby restoring full motion positioning accuracy while maintaining cable connectivity through alternative means such as stationary conduits or wireless interfaces.
Solution Approach 2:
The patent substitutes the mechanical cable-drag system with a non-mechanical or minimized-mechanical connection system. By using optical fibers, wireless communication, or rotary electrical joints with minimal friction, the system eliminates cable interference with wafer stage motion, thus preserving manufacturing precision while maintaining adaptability.
3Reliability
If devices for preventing collision between stages are added due to overlapped work space, then collision prevention is achieved, but manufacturing cost is raised
Solution Approach 1:
The patent implements dynamic collision prevention through real-time position monitoring and active control. Motion positioning detectors continuously track the locations of both wafer stages, and the control system dynamically adjusts their trajectories or speeds to maintain safe separation, eliminating the need for static physical barriers or complex mechanical collision prevention devices.
Solution Approach 2:
The patent employs feedback-based collision avoidance where motion positioning detectors provide continuous position information to the control system, which then adjusts the motion of the wafer stages in real-time. This closed-loop control ensures that even with overlapped work spaces, the stages will not collide, achieving reliable collision prevention without adding expensive mechanical prevention devices.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution simplifies the system, reduces interference between stages, enhances positioning accuracy, and lowers manufacturing costs by eliminating the need for a cable stage and preventing stage overlap during switching.
Implementation Method 1
utilizing gas levitation or magnetic levitation to connect wafer stages via X and Y-direction guide bars
Implementation Method 2
utilizing gas levitation or magnetic levitation to connect wafer stages via X and Y-direction guide bars
Implementation Method 3
with linear motors and vacuum pipeline units for frictionless movement and temporary vacuum environments
Data Source
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AI summary
A dual stage positioning and switching system comprises at least a base, a first object stage positioning unit disposed on the base for a first workstation, and a second object stage positioning unit for a second workstation. Each of the object stage positioning units comprises at least a supporting structure, an X-direction guide bar, a Y-direction guide bar, and a motion positioning detector, wherein, the supporting structure comprises an object stage, and an object stage connector moving relative to the object stage. The object stage positioning unit further comprises a driver connecting to the object stage connector and driving the connector to move along the X-direction guide bar. The X-direction guide bar is positioned on and movable along the Y-direction guide bar. The system further comprises an object stage connector for transitional use during the switching process, which is positioned at the center of the Y-direction guide bar located on one of the base.