Dual Side-by-Side Wafer Transfer Robot Position Correction
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Solution Overview
Problem
Current wafer handling systems in semiconductor fabrication face challenges in throughput due to the need for wafer position adjustments during transfer, which can slow down the processing time and reduce the number of wafers that can be processed efficiently.
Innovation Solution
The implementation of a dual side-by-side end effector robot system that actively corrects wafer positions during transfer, allowing for simultaneous handling and placement of two wafers using a nominal path with extension and rotation adjustments, thereby increasing throughput.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a single wafer transfer robot is used with position correction, then manufacturing precision is maintained, but productivity is limited
Solution Approach 1:
The system divides the wafer transfer function into two independent end effectors that operate simultaneously. Each end effector handles one wafer independently, allowing parallel transfer operations while maintaining individual position correction capabilities for each wafer, thus doubling throughput without sacrificing precision
Solution Approach 2:
The patent combines two wafer transfer operations into a single coordinated system. The dual end effector robot merges the functionality of two separate transfer robots, performing simultaneous wafer transfers with shared control and coordination, achieving increased productivity while maintaining precision through unified position correction
2Manufacturing precision
If wafer position correction is performed during transfer, then manufacturing precision is improved, but processing time increases
Solution Approach 1:
The system performs position measurements and calculations during the wafer transfer motion itself, rather than after placement. The nominal path is pre-calculated, and position corrections are computed in real-time during transfer, eliminating post-placement adjustment time and preventing processing delays
Solution Approach 2:
The dual end effector system maintains continuous wafer transfer operations without idle time. While one end effector is correcting position, the other continues its transfer operation. The system eliminates waiting time by keeping both effectors continuously productive throughout the transfer cycle
3Productivity
If two wafers are transferred simultaneously with position correction, then productivity is doubled, but device complexity increases
Solution Approach 1:
The dual end effector robot serves multiple functions: it can transfer wafers independently, perform position corrections on each wafer, and coordinate their movements. This multi-functional design consolidates what would otherwise require separate specialized devices, increasing productivity without proportionally increasing overall system complexity
Solution Approach 2:
The controller acts as an intermediary that coordinates the two end effectors. It manages the complex interactions between simultaneous transfers and position corrections by calculating nominal paths and coordinating movements, simplifying the control architecture while enabling sophisticated dual-wafer operations
Data Source
AI summary
Methods and systems for positioning wafers using a dual side-by-side end effector robot are provided. The methods involve performing place moves using dual side-by-side end effector robots with active wafer position correction. According to various embodiments, the methods may be used for placement into a process module, loadlock or other destination by a dual wafer transfer robot. The methods provide nearly double the throughput of a single wafer transfer schemes by transferring two wafers with the same number of moves.