Dummy Data Line Width Adjustment for Narrow-Bezel Display Yield
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Solution Overview
Problem
In narrow-bezel display manufacturing, the small size of data lines and spaces between them leads to weak connections or disconnections during the formation process, resulting in defects like open circuits and lower product yields due to overexposure and over-etching near the edge of the substrate.
Innovation Solution
The use of a dummy data line with a greater width than the effective data line, positioned closer to the edge of the substrate, which absorbs excessive energy and particles during exposure and etching processes, reducing the risk of defects and improving yield.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If data lines are made smaller and more densely routed to achieve narrow-bezel display, then the visible area increases and simplicity is improved, but the connection strength deteriorates and defects increase
Solution Approach 1:
The patent applies local quality by making the dummy data line have a different width (greater than) compared to the effective data line. This local variation in width provides enhanced protection specifically at the edge region where overexposure and over-etching are most severe, without affecting the overall circuit functionality.
Solution Approach 2:
The dummy data line serves as a beforehand cushioning structure that absorbs excessive energy and particles during exposure and etching processes. This protective buffer is positioned at the edge before the harmful effects can reach the effective data lines, preventing defects in advance.
2Length of stationary object
If data line width is reduced to achieve narrow-bezel design, then the bezel size is narrowed, but the manufacturing precision deteriorates due to overexposure and over-etching
Solution Approach 1:
The dummy data line acts as an intermediary structure between the edge of the substrate and the effective data lines. It mediates the harmful effects of overexposure and over-etching by absorbing excessive energy and particles, thereby protecting the effective data lines from manufacturing defects.
Solution Approach 2:
The patent changes the width parameter of the dummy data line to be greater than that of the effective data line. This parameter modification creates a protective buffer zone that absorbs manufacturing variability and prevents defects in the effective data lines during exposure and etching processes.
3Reliability
If dummy data line width is increased to protect against defects, then the reliability improves, but the device complexity increases
Solution Approach 1:
The dummy data line performs multiple functions: it serves as a protective buffer against overexposure and over-etching, absorbs excessive energy and particles, and maintains the overall wiring structure. This multi-functionality justifies the additional structure by providing comprehensive protection without requiring multiple separate protective measures.
Data Source
AI summary
An array substrate, a method for manufacturing an array substrate, a display panel and a display device are provided. The array substrate includes: a base substrate including a display area and a non-display area; a dummy data line in the non-display area of the base substrate; and an effective data line in the non-display area of the base substrate. The dummy data line is closer to an edge of the base substrate than the effective data line, and a width of the dummy data line is greater than a width of the effective data line.