Dummy Sub-Pixel Resist Layout for Narrow Display Frame
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Solution Overview
Problem
Current display panels face challenges in achieving a large viewable area while maintaining a narrow frame, as existing designs often require a wide periphery area due to the placement of dummy color resists and peripheral drive circuits, which limits spatial efficiency.
Innovation Solution
A pixel structure substrate is designed with a specific arrangement of dummy color resists and a peripheral drive circuit, where the third dummy sub-pixel in each dummy pixel does not include color resists, allowing for a transfer electrode to connect the drive circuit to signal lines, thereby reducing the frame width and increasing spatial efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If dummy color resists are disposed in all dummy sub-pixels, then manufacturing uniformity is improved, but the periphery area increases and frame width becomes wider
Solution Approach 1:
The patent applies local quality by differentiating the treatment of dummy sub-pixels: some dummy sub-pixels (first and second) are equipped with dummy color resists to maintain manufacturing uniformity, while others (third) are left without dummy color resists to reduce periphery area. This selective approach allows the frame width to be narrowed while still preserving manufacturing uniformity in the critical regions.
2Adaptability or versatility
If peripheral drive circuit is disposed in the periphery area, then drive function is achieved, but the frame width increases
Solution Approach 1:
The patent utilizes the vertical dimension within the periphery area by disposing the peripheral drive circuit in the third dummy sub-pixel that is located between other dummy sub-pixels. This effective use of vertical space allows the drive circuit to be integrated without increasing the horizontal frame width, thereby achieving drive function while maintaining a narrow frame design.
3Manufacturing precision
If the third dummy sub-pixel includes dummy color resist, then manufacturing uniformity is improved, but transfer electrode placement is restricted and frame width increases
Solution Approach 1:
The patent applies local quality by selectively providing dummy color resists only in certain dummy sub-pixels (first and second) while omitting them from the third dummy sub-pixel. This selective approach maintains manufacturing uniformity in regions where it is critical, while creating space in the third dummy sub-pixel for transfer electrode placement, thereby resolving the conflict between manufacturing uniformity and electrode placement flexibility.
Data Source
AI summary
A pixel structure substrate includes a first substrate, a plurality of first, second, and third color resists, at least two dummy color resists, and at least one transfer electrode. The first substrate has a display area and a periphery area, where the periphery area has a plurality of dummy pixels, each dummy pixel includes at least three dummy sub-pixels, and the display area has a plurality of sub-pixel units. The first, the second, and the third color resists are respectively disposed on at least some of the sub-pixel units. The at least two dummy color resists are disposed in a first one and a second one in the three dummy sub-pixels included in at least one dummy pixel, and a third one does not include the dummy color resists and the first, the second, and the third color resists. The at least one transfer electrode is disposed in the third one in the three dummy sub-pixels included in the at least one dummy pixel.