Dust Emission Source Identification in Semiconductor Inspection Devices
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Solution Overview
Problem
In semiconductor inspection devices, foreign matter often adheres to samples during loading and unloading due to dust emission from mechanisms, making it difficult to identify the source of dust emission, as current methods rely on manual operations which are inefficient.
Innovation Solution
A device with a control system that executes pre-defined scripts to intentionally repeat operations, causing dust emission and adhering it to a sample, allowing for the specification of the dust emission source through automated processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If manual operations are used to identify dust emission sources, then the process can be performed with simple equipment, but the time and effort required to diagnose dust-related issues increases significantly
Solution Approach 1:
The system performs preliminary actions by automatically executing sequences of mechanism operations and sample inspections before a complete diagnosis is needed. The automated system proactively identifies dust emission sources by systematically operating mechanisms and checking samples, eliminating the need for time-consuming manual trial-and-error procedures.
Solution Approach 2:
The control system acts as an intermediary between the mechanism operations and the diagnosis process. It coordinates the automated execution of mechanism sequences, manages sample inspections, and processes the results to identify dust emission sources, replacing manual coordination with an automated intermediary system.
2Productivity
If automated scripts are used to repeat mechanism operations, then the diagnosis process becomes more efficient, but the device complexity increases
Solution Approach 1:
The control system serves multiple functions: it executes mechanism operations, coordinates sample inspections, processes inspection results, and identifies dust emission sources. By making the control system universal and multi-functional, the patent avoids adding separate dedicated systems for each function, thereby limiting the increase in overall device complexity while achieving automated diagnosis.
Solution Approach 2:
The system performs self-service by automatically executing diagnosis procedures without requiring external manual intervention. The control system autonomously manages the entire diagnosis process from mechanism operation to result analysis, enabling the system to serve its own diagnostic needs without additional complex external equipment.
Data Source
AI summary
In order to specify a dust emitting mechanism portion, a wafer must be provided near a mechanism portion in operation and the mechanism portion must be operated so that foreign matter sticks to a surface of the wafer. A mechanism that allows foreign matter to stick to a wafer by repeating operation of each of particular portions in a device and thus intentionally bringing about dust emission is provided. For example, the device includes a control device, a sample chamber in which a sample is processed, and a mechanism that loads and unloads a sample to and from the sample chamber, the mechanism has a plurality of portions, the control device has a script, and a particular portion of the plurality of portions of the mechanism is repeatedly operated as the control device executes the script.