DUV Optical Oscillator Control for In-Production Calibration
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Solution Overview
Problem
Existing photolithography systems face inefficiencies and downtime due to the need for offline calibration of multiple deep ultraviolet (DUV) optical oscillators, which disrupts the continuous production of exposure beams during semiconductor manufacturing.
Innovation Solution
A control system that monitors and manages a plurality of DUV optical oscillators, allowing in-production calibration of a subset of oscillators without interrupting the exposure beam by using beam control apparatuses and shutters to isolate non-contributing oscillators for calibration, while maintaining beam production.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If offline calibration of multiple DUV optical oscillators is performed, then calibration accuracy is improved, but production downtime increases
Solution Approach 1:
The patent divides the plurality of optical oscillators into multiple groups, where each group can be independently calibrated. The beam control apparatus enables selective isolation of specific oscillator groups from the exposure beam path, allowing calibration to be performed on one group while other groups continue producing the exposure beam. This segmentation resolves the contradiction by enabling parallel operation of calibration and production functions across different oscillator subsets.
Solution Approach 2:
The system performs preliminary calibration actions on oscillator groups that are not currently needed for exposure beam production. The control system monitors oscillator performance and proactively schedules calibration during periods when those specific oscillators would otherwise be idle or less critical to production. This preliminary action approach maintains calibration accuracy while minimizing disruption to overall production continuity.
2Stability of the object's composition
If frequent calibration of optical oscillators is performed, then beam consistency is improved, but system availability deteriorates
Solution Approach 1:
By segmenting oscillators into multiple independently controllable groups with the beam control apparatus, the system can frequently calibrate one group without taking the entire system offline. Each oscillator group can be calibrated independently and in rotation, ensuring that beam consistency is maintained across all groups through frequent calibration while system availability is preserved through parallel operation of calibration and production on different groups.
Solution Approach 2:
The system maintains continuous exposure beam production by ensuring that while one oscillator group undergoes calibration, other groups continue producing the exposure beam. The beam control apparatus dynamically routes beams from active groups to the output while isolating calibration groups. This continuity principle resolves the contradiction by making the calibration process non-interruptive to overall system availability while still achieving frequent calibration for beam consistency.
3Adaptability or versatility
If multiple beam control apparatuses are used to isolate oscillators for calibration, then calibration flexibility is improved, but device complexity increases
Solution Approach 1:
The beam control apparatus is designed as a universal, multi-functional device that can selectively isolate any oscillator group from any exposure beam path. Rather than implementing separate dedicated control mechanisms for each oscillator or group, a single versatile beam control apparatus handles all isolation and routing functions. This multi-functionality achieves high calibration flexibility while avoiding the complexity multiplication that would result from multiple specialized control systems.
Data Source
AI summary
A deep ultraviolet (DUV) optical system includes: an optical source system including: a plurality of optical oscillators; a beam combiner; and a beam control apparatus between the optical oscillators and the beam combiner. The beam combiner is configured to receive and direct light emitted from any of the optical oscillators toward a scanner apparatus as an exposure light beam, and the beam control apparatus is configured to determine whether the beam combiner receives light from a particular one of the optical oscillators. The DUV optical lithography system also includes a control system coupled to the optical source system, the control system configured to: determine whether a condition exists in the DUV optical system, and based on a determination that the condition exists, perform a calibration action in a subset of the optical oscillators.