Dural Venous Sinus Anchor for Single-Hole Hydrocephalus Drainage
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Solution Overview
Problem
Existing devices for treating hydrocephalus suffer from high failure rates due to issues such as challenging surgical procedures, catheter blockages, infections, inadequate fluid flow, and risks of bleeding and air embolism, with inadequate placement of catheters in cerebrospinal fluid (CSF) spaces.
Innovation Solution
A method and system for draining CSF into the dural venous sinus (DVS) through a single cranial hole without penetrating the brain's gray matter, using modular devices that allow for easy servicing and replacement of components, and a DVS implant anchor with adjustable positioning and sealing to minimize invasiveness and reduce complications.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If catheters are placed in CSF spaces using existing methods, then CSF drainage is achieved, but the risk of bleeding and air embolism increases
Solution Approach 1:
The patent introduces a dural venous sinus (DVS) as an intermediary drainage site between the CSF space and the venous system. By placing the catheter tip in the DVS rather than directly in brain tissue or ventricles, the system mediates the drainage process to reduce the risk of bleeding and air embolism while maintaining effective CSF removal
Solution Approach 2:
The catheter system is divided into distinct segments: an external portion for access, a dural portion for sealing against the dura mater, and an internal portion for CSF drainage. This segmentation allows each portion to be optimized for its specific function, improving safety and reducing complications
2Productivity
If traditional shunt designs are used, then CSF drainage is established, but catheter blockages and infections occur frequently
Solution Approach 1:
The catheter incorporates a self-adjusting flow control mechanism with a flexible membrane that automatically regulates CSF flow based on pressure gradients. This self-service feature reduces the need for manual adjustment and minimizes the risk of blockages by preventing excessive flow rates that could lead to clot formation
Solution Approach 2:
The system utilizes pressure differential as a controlling parameter, where the flexible membrane responds to changes in CSF pressure relative to venous pressure. This parameter-based control allows the system to adapt to varying physiological conditions, maintaining effective drainage while reducing the risk of infections and blockages
3Reliability
If surgical procedures are performed to implant catheters in CSF spaces, then hydrocephalus treatment is achieved, but the surgical complexity and invasiveness increase
Solution Approach 1:
The patent combines multiple functions into a single catheter device: CSF access, dural sealing, venous sinus drainage, and flow control. This integration simplifies the surgical procedure by reducing the number of separate implantation steps while maintaining treatment effectiveness
Solution Approach 2:
The dural venous sinus serves as an intermediary site that is more accessible and safer for catheter placement than direct ventricular access. This intermediary approach reduces surgical complexity by avoiding the need to navigate through brain tissue, thereby reducing invasiveness while maintaining therapeutic effect
4Productivity
If catheters drain CSF into venous sinuses, then fluid flow is improved, but the risk of introducing air into the sinuses increases
Solution Approach 1:
The catheter incorporates a one-way valve mechanism that is pre-configured to prevent air entry into the venous sinus. This preliminary protective action ensures that while CSF can flow freely into the sinus, air bubbles are blocked, thereby maintaining improved fluid flow without increasing air embolism risk
Data Source
AI summary
A dural venous sinus (DVS) implant anchor includes a body comprising a first portion extending in a first longitudinal direction, a second portion extending in a second longitudinal direction opposite the first longitudinal direction, and a connector portion coupled to the first portion and the second portion at an offset depth that corresponds to a depth of a first part of a thickness of a skull of a subject. When the DVS implant anchor is disposed within a DVS burr hole in the skull of the subject, the first portion extends along an outside surface of the skull and the second portion is at least partially disposed within the DVS burr hole.


